发明申请
US20100277967A1 GRADED METAL OXIDE RESISTANCE BASED SEMICONDUCTOR MEMORY DEVICE 有权
基于金属氧化物电阻的半导体存储器件

GRADED METAL OXIDE RESISTANCE BASED SEMICONDUCTOR MEMORY DEVICE
摘要:
Memory devices are described along with methods for manufacturing and methods for operating. A memory device as described herein includes a plurality of memory cells located between word lines and bit lines. Memory cells in the plurality of memory cells comprise a diode and a metal-oxide memory element programmable to a plurality of resistance states including a first and a second resistance state, the diode of the memory element arranged in electrical series along a current path between a corresponding word line and a corresponding bit line. The device further includes bias circuitry to apply bias arrangements across the series arrangement of the diode and the memory element of a selected memory cell in the plurality of memory cells.
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