发明申请
US20100277967A1 GRADED METAL OXIDE RESISTANCE BASED SEMICONDUCTOR MEMORY DEVICE
有权
基于金属氧化物电阻的半导体存储器件
- 专利标题: GRADED METAL OXIDE RESISTANCE BASED SEMICONDUCTOR MEMORY DEVICE
- 专利标题(中): 基于金属氧化物电阻的半导体存储器件
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申请号: US12431983申请日: 2009-04-29
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公开(公告)号: US20100277967A1公开(公告)日: 2010-11-04
- 发明人: MING-DAOU LEE , Erh-Kun Lai , Kuang-Yeu Hsieh , Wei-Chih Chien , Chien-Hung Yeh
- 申请人: MING-DAOU LEE , Erh-Kun Lai , Kuang-Yeu Hsieh , Wei-Chih Chien , Chien-Hung Yeh
- 申请人地址: TW Hsinchu
- 专利权人: MACRONIX INTERNATIONAL CO., LTD.
- 当前专利权人: MACRONIX INTERNATIONAL CO., LTD.
- 当前专利权人地址: TW Hsinchu
- 主分类号: G11C11/00
- IPC分类号: G11C11/00 ; H01L47/00
摘要:
Memory devices are described along with methods for manufacturing and methods for operating. A memory device as described herein includes a plurality of memory cells located between word lines and bit lines. Memory cells in the plurality of memory cells comprise a diode and a metal-oxide memory element programmable to a plurality of resistance states including a first and a second resistance state, the diode of the memory element arranged in electrical series along a current path between a corresponding word line and a corresponding bit line. The device further includes bias circuitry to apply bias arrangements across the series arrangement of the diode and the memory element of a selected memory cell in the plurality of memory cells.
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