发明申请
- 专利标题: High Contrast Lithographic Masks
- 专利标题(中): 高对比度平版印刷面膜
-
申请号: US12463742申请日: 2009-05-11
-
公开(公告)号: US20100283982A1公开(公告)日: 2010-11-11
- 发明人: Saeed Bagheri , David O.S. Melville , Alan E. Rosenbluth , Kehan Tian
- 申请人: Saeed Bagheri , David O.S. Melville , Alan E. Rosenbluth , Kehan Tian
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 主分类号: G03B27/54
- IPC分类号: G03B27/54
摘要:
A structure and a method for an equi-brightness optimization. The method may include projecting a plurality of bright patterns having a plurality of bright points and a plurality of dark patterns having a plurality of dark points on a substrate, generating a plurality of joint eigenvectors of the plurality of bright points and a plurality of dark points, selecting a predetermined number of joint eigenvectors to project the plurality of bright patterns, generating a plurality of natural sampling points from the plurality of bright points, wherein the plurality of natural sampling points has a substantially equal intensity, and obtaining a representation of an aperture from the plurality of natural sampling points, wherein an image of the representation of the aperture has a substantially uniform intensity.
公开/授权文献
- US07944545B2 High contrast lithographic masks 公开/授权日:2011-05-17
信息查询