发明申请
US20100289037A1 SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE
审中-公开
半导体器件及其制造方法及显示器件
- 专利标题: SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE
- 专利标题(中): 半导体器件及其制造方法及显示器件
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申请号: US12812162申请日: 2008-10-10
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公开(公告)号: US20100289037A1公开(公告)日: 2010-11-18
- 发明人: Shin Matsumoto , Yutaka Takafuji , Yasumori Fukushima , kenshi Tada
- 申请人: Shin Matsumoto , Yutaka Takafuji , Yasumori Fukushima , kenshi Tada
- 优先权: JP2008-006168 20080115
- 国际申请: PCT/JP2008/068493 WO 20081010
- 主分类号: H01L33/00
- IPC分类号: H01L33/00 ; H01L27/092 ; H01L21/336 ; H01L29/786
摘要:
The present invention provides a semiconductor device having a plurality of MOS transistors with controllable threshold values in the same face and easy to manufacture, a manufacturing method thereof and a display device. The invention is a semiconductor device having a plurality of MOS transistors in the same face each having a structure formed by stacking a semiconductor active layer, a gate insulator, and a gate electrode, wherein the semiconductor device includes: an insulating layer stacked on a side opposite to a gate electrode side of the semiconductor active layer; and a conductive electrode stacked on a side opposite to a semiconductor active layer side of the insulating layer and extending over at least two of the plurality of MOS transistors.
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