发明申请
US20100297556A1 Coating compositions suitable for use with an overcoated photoresist
审中-公开
适用于外涂光致抗蚀剂的涂料组合物
- 专利标题: Coating compositions suitable for use with an overcoated photoresist
- 专利标题(中): 适用于外涂光致抗蚀剂的涂料组合物
-
申请号: US12658614申请日: 2010-02-08
-
公开(公告)号: US20100297556A1公开(公告)日: 2010-11-25
- 发明人: James F. Cameron , Jin Wuk Sung , John P. Amara , Gregory P. Prokopowicz , David A. Valeri
- 申请人: James F. Cameron , Jin Wuk Sung , John P. Amara , Gregory P. Prokopowicz , David A. Valeri
- 申请人地址: US MA Marlborough
- 专利权人: Rohm and Haas Electronic Materials LLC
- 当前专利权人: Rohm and Haas Electronic Materials LLC
- 当前专利权人地址: US MA Marlborough
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; G03F7/20 ; C08G73/10 ; C07D487/08
摘要:
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
公开/授权文献
信息查询
IPC分类: