发明申请
US20100304046A1 PLASMA GENERATOR, PLASMA CONTROL METHOD AND METHOD OF PRODUCING SUBSTRATE
有权
等离子体发生器,等离子体控制方法和生产基材的方法
- 专利标题: PLASMA GENERATOR, PLASMA CONTROL METHOD AND METHOD OF PRODUCING SUBSTRATE
- 专利标题(中): 等离子体发生器,等离子体控制方法和生产基材的方法
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申请号: US12836161申请日: 2010-07-14
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公开(公告)号: US20100304046A1公开(公告)日: 2010-12-02
- 发明人: Shoji Miyake , Akinori Ebe , Tatsuo Shoji , Yuichi Setsuhara
- 申请人: Shoji Miyake , Akinori Ebe , Tatsuo Shoji , Yuichi Setsuhara
- 申请人地址: JP Osaka JP Kyoto-shi JP Kawaguchi-shi
- 专利权人: Shoji Miyake,Akinori Ebe,JAPAN SCIENCE AND TECHNOLOGY AGENCY
- 当前专利权人: Shoji Miyake,Akinori Ebe,JAPAN SCIENCE AND TECHNOLOGY AGENCY
- 当前专利权人地址: JP Osaka JP Kyoto-shi JP Kawaguchi-shi
- 优先权: JP2002-363988 20021216; JP2002-363989 20021216; JP2003-014718 20030123
- 主分类号: C23C16/52
- IPC分类号: C23C16/52 ; C23C16/00 ; C23C16/505
摘要:
The present invention aims to provide a plasma generator capable of creating a spatially uniform distribution of high-density plasma. This object is achieved by the following construction. Multiple antennas are located on the sidewall of a vacuum chamber, and a RF power source is connected to three or four antennas in parallel via a plate-shaped conductor. The length of the conductor of each antenna is shorter than the quarter wavelength of the induction electromagnetic wave generated within the vacuum chamber. Setting the length of the conductor of the antenna in such a manner prevents the occurrence of a standing wave and thereby maintains the uniformity of the plasma within the vacuum chamber. In addition, the plate-shaped conductor improves the heat-releasing efficiency, which also contributes to the suppression of the impedance.