发明申请
- 专利标题: ELECTRODE COVERING MATERIAL, ELECTRODE STRUCTURE AND SEMICONDUCTOR DEVICE
- 专利标题(中): 电极覆盖材料,电极结构和半导体器件
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申请号: US12515585申请日: 2007-11-21
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公开(公告)号: US20100314611A1公开(公告)日: 2010-12-16
- 发明人: Masaki Murata , Nobuhide Yoneya , Norio Kimura
- 申请人: Masaki Murata , Nobuhide Yoneya , Norio Kimura
- 申请人地址: JP Tokyo
- 专利权人: SONY CORPORATION
- 当前专利权人: SONY CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2006-315845 20061122
- 国际申请: PCT/JP2007/072581 WO 20071121
- 主分类号: H01L51/30
- IPC分类号: H01L51/30 ; B32B15/08 ; C07D401/14 ; C09D7/00
摘要:
A semiconductor device is provided and includes a field effect transistor having a gate electrode, a gate insulating layer, a channel forming region composed of an organic semiconductor material layer and a source/drain electrode made of a metal. A portion of the source/drain electrode in contact with the organic semiconductor material layer comprising the channel forming region is covered with an electrode coating material. Because the electrode coating material is composed of organic molecules having a functional group which can be bound to a metal ion and a functional group that binds to the source/drain electrode composed of the metal, low contact resistance and high mobility can be achieved.
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