发明申请
- 专利标题: Compound Semiconductor Single-Crystal Manufacturing Device and Manufacturing Method
- 专利标题(中): 复合半导体单晶制造装置及制造方法
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申请号: US12668426申请日: 2009-03-06
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公开(公告)号: US20100319614A1公开(公告)日: 2010-12-23
- 发明人: Issei Satoh , Naho Mizuhara , Keisuke Tanizaki , Michimasa Miyanaga , Takashi Sakurada , Hideaki Nakahata
- 申请人: Issei Satoh , Naho Mizuhara , Keisuke Tanizaki , Michimasa Miyanaga , Takashi Sakurada , Hideaki Nakahata
- 申请人地址: JP Osaka-shi
- 专利权人: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- 当前专利权人: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- 当前专利权人地址: JP Osaka-shi
- 优先权: JP2008-061444 20080311
- 国际申请: PCT/JP2009/054281 WO 20090306
- 主分类号: C30B23/06
- IPC分类号: C30B23/06 ; C30B23/00
摘要:
A compound semiconductor single-crystal manufacturing device (1) is furnished with: a laser light source (6) making it possible to sublime a source material by directing a laser beam onto the material; a reaction vessel (2) having a laser entry window (5) through which the laser beam output from the laser light source (6) can be transmitted to introduce the beam into the vessel interior, and that is capable of retaining a starting substrate (3) where sublimed source material is recrystallized; and a heater (7) making it possible to heat the starting substrate (3). The laser beam is shone on, to heat and thereby sublime, the source material within the reaction vessel (2), and compound semiconductor single crystal is grown by recrystallizing the sublimed source material onto the starting substrate (3); afterwards the laser beam is employed to separate the compound semiconductor single crystal from the starting substrate (3).