Invention Application
US20110003078A1 APPARATUS FOR TREATING SURFACE AND METHOD OF TREATING SURFACE
审中-公开
用于处理表面的设备和处理表面的方法
- Patent Title: APPARATUS FOR TREATING SURFACE AND METHOD OF TREATING SURFACE
- Patent Title (中): 用于处理表面的设备和处理表面的方法
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Application No.: US12921643Application Date: 2009-03-13
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Publication No.: US20110003078A1Publication Date: 2011-01-06
- Inventor: Kippei Sugita , Hiroyuki Hashimoto , Muneo Harada
- Applicant: Kippei Sugita , Hiroyuki Hashimoto , Muneo Harada
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Priority: JP2008-078812 20080325
- International Application: PCT/JP2009/054885 WO 20090313
- Main IPC: B05D3/10
- IPC: B05D3/10 ; B05C11/11
Abstract:
An aqueous solution containing an adhesion promoter in an amount of 20 vol. % or more is heated and vaporized to a temperature of 80 to 100° C. to produce a water-containing adhesion promoter vapor, and the water-containing adhesion promoter vapor is adhered to and condensed on a surface of a substrate, to cause a heating and dehydrating reaction by which the adhesion promoter is adhered to the surface of the substrate.
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