发明申请
US20110003078A1 APPARATUS FOR TREATING SURFACE AND METHOD OF TREATING SURFACE
审中-公开
用于处理表面的设备和处理表面的方法
- 专利标题： APPARATUS FOR TREATING SURFACE AND METHOD OF TREATING SURFACE
- 专利标题（中）： 用于处理表面的设备和处理表面的方法
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申请号： US12921643申请日： 2009-03-13
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公开(公告)号： US20110003078A1公开(公告)日： 2011-01-06
- 发明人: Kippei Sugita , Hiroyuki Hashimoto , Muneo Harada
- 申请人： Kippei Sugita , Hiroyuki Hashimoto , Muneo Harada
- 申请人地址： JP Tokyo
- 专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人地址： JP Tokyo
- 优先权： JP2008-078812 20080325
- 国际申请： PCT/JP2009/054885 WO 20090313
- 主分类号： B05D3/10
- IPC分类号： B05D3/10 ; B05C11/11
摘要：
An aqueous solution containing an adhesion promoter in an amount of 20 vol. % or more is heated and vaporized to a temperature of 80 to 100° C. to produce a water-containing adhesion promoter vapor, and the water-containing adhesion promoter vapor is adhered to and condensed on a surface of a substrate, to cause a heating and dehydrating reaction by which the adhesion promoter is adhered to the surface of the substrate.
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