发明申请
- 专利标题: SEMICONDUCTOR PHOTODIODE DEVICE AND MANUFACTURING METHOD THEREOF
- 专利标题(中): 半导体光电设备及其制造方法
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申请号: US12838445申请日: 2010-07-17
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公开(公告)号: US20110031529A1公开(公告)日: 2011-02-10
- 发明人: Makoto MIURA , Shinichi Saito , Youngkun Lee , Katsuya Oda
- 申请人: Makoto MIURA , Shinichi Saito , Youngkun Lee , Katsuya Oda
- 专利权人: HITACHI, LTD.
- 当前专利权人: HITACHI, LTD.
- 优先权: JP2009-182990 20090806
- 主分类号: H01L31/0352
- IPC分类号: H01L31/0352 ; H01L31/18 ; H01L31/10
摘要:
A semiconductor photodiode device includes a semiconductor substrate, a first buffer layer containing a material different from that of the semiconductor substrate in a portion thereof, a first semiconductor layer formed above the buffer layer and having a lattice constant different from that of the semiconductor substrate, a second buffer layer formed above the first semiconductor layer and containing an element identical with that of the first semiconductor layer in a portion thereof, and a second semiconductor layer formed above the buffer layer in which a portion of the first semiconductor layer is formed of a plurality of island shape portions each surrounded with an insulating film, and the second buffer layer allows adjacent islands of the first semiconductor layer to coalesce with each other and is in contact with the insulating film.
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