Invention Application
- Patent Title: PATTERN DETERMINING METHOD
- Patent Title (中): 图案确定方法
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Application No.: US12860278Application Date: 2010-08-20
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Publication No.: US20110047518A1Publication Date: 2011-02-24
- Inventor: Issui Aiba , Takafumi Taguchi , Hiromitsu Mashita , Taiga Uno , Fumiharu Nakajima , Toshiya Kotani , Tadahito Fujisawa
- Applicant: Issui Aiba , Takafumi Taguchi , Hiromitsu Mashita , Taiga Uno , Fumiharu Nakajima , Toshiya Kotani , Tadahito Fujisawa
- Priority: JP2009-191855 20090821
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
According to the embodiments, a first representative point is set on outline pattern data on a pattern formed in a process before a processed pattern. Then, a minimum distance from the first representative point to a peripheral pattern is calculated. Then, area of a region with no pattern, which is sandwiched by the first representative point and the peripheral pattern, in a region within a predetermined range from the first representative point is calculated. Then, it is determined whether the first representative point becomes a processing failure by using the minimum distance and the area.
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