发明申请
- 专利标题： PATTERN FORMING METHOD
- 专利标题（中）： 图案形成方法
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申请号： US12878828申请日： 2010-09-09
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公开(公告)号： US20110059406A1公开(公告)日： 2011-03-10
- 发明人: Yoshihisa KAWAMURA , Eishi Shiobara , Shinichi Ito
- 申请人： Yoshihisa KAWAMURA , Eishi Shiobara , Shinichi Ito
- 优先权： JPP2009-209086 20090910
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
According to one embodiment, a pattern forming method is disclosed. The method can include selectively providing a curing agent to a pattern in a template, contacting the template provided the curing agent to a substrate, irradiating the curing agent with light where the template and the substrate are contacted each other to harden the curing agent, demolding the template from the substrate to form a curing agent pattern on the substrate, and etching the substrate on a basis of the curing agent pattern.
公开/授权文献
- US08753803B2 Pattern forming method 公开/授权日：2014-06-17
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