Invention Application
US20110065232A1 PRINTING PROCESS FOR ENHANCED JETTED PERFORMANCE OF SEMICONDUCTOR LAYER
有权
用于增强半导体层的喷射性能的印刷工艺
- Patent Title: PRINTING PROCESS FOR ENHANCED JETTED PERFORMANCE OF SEMICONDUCTOR LAYER
- Patent Title (中): 用于增强半导体层的喷射性能的印刷工艺
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Application No.: US12560032Application Date: 2009-09-15
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Publication No.: US20110065232A1Publication Date: 2011-03-17
- Inventor: Yiliang Wu , Stephan Drappel , Nan-Xing Hu , Paul F. Smith
- Applicant: Yiliang Wu , Stephan Drappel , Nan-Xing Hu , Paul F. Smith
- Applicant Address: US CT Norwalk
- Assignee: Xerox Corporation
- Current Assignee: Xerox Corporation
- Current Assignee Address: US CT Norwalk
- Main IPC: H01L51/30
- IPC: H01L51/30
Abstract:
Exemplary embodiments provide materials and processes for forming organic semiconductor features by heating a liquid composition containing semiconductor particles into a Newtonian solution for a uniform deposition.
Public/Granted literature
- US08030126B2 Printing process for enhanced jetted performance of semiconductor layer Public/Granted day:2011-10-04
Information query
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