发明申请
- 专利标题： LITHOGRAPHIC APPARATUS AND METHOD FOR CALIBRATING THE SAME
- 专利标题（中）： 平台设备及其校准方法
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申请号： US12964483申请日： 2010-12-09
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公开(公告)号： US20110075154A1公开(公告)日： 2011-03-31
- 发明人: Erik Roelof LOOPSTRA , Leon Martin Levasier , Rene Oesterholt
- 申请人： Erik Roelof LOOPSTRA , Leon Martin Levasier , Rene Oesterholt
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G01B11/02
- IPC分类号： G01B11/02 ; G01B11/14
摘要：
A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.
公开/授权文献
- US08368902B2 Lithographic apparatus and method for calibrating the same 公开/授权日：2013-02-05