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    Lithographic apparatus and method for calibrating the same
    1.
    发明申请
    Lithographic apparatus and method for calibrating the same 有权
    平版印刷设备及其校准方法

    公开(公告)号：US20060023194A1

    公开(公告)日：2006-02-02

    申请号：US10899295

    申请日：2004-07-27

    Applicant: Erik Loopstra ,  Leon Levasier ,  Rene Oesterholt

    Inventor： Erik Loopstra ,  Leon Levasier ,  Rene Oesterholt

    IPC: G03B27/58

    CPC classification number: G03F7/70775 ,  G03F7/70458 ,  G03F7/70516 ,  G03F9/7011 ,  G03F9/7019

    Abstract: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is described.

    Abstract translation: 光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。 运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。 为了测量衬底台的位置和取向，每个位置检测器包括一维或多维类型的光学编码器，光学编码器被布置为一起提供至少6个位置值，为每个位置值提供至少一个位置值 的三维。 所述至少3个光学编码器中的3个或更多个在所述三维坐标系中的不同位置连接到所述基板台。 运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置，并且从另一个子集计算相对于坐标系的衬底台的取向 至少6个位置值中的3个。 此外，描述了用于校准位置检测器的方法。

    Lithographic apparatus and method for calibrating the same
    2.
    发明授权
    Lithographic apparatus and method for calibrating the same 有权
    平版印刷设备及其校准方法

    公开(公告)号：US07859686B2

    公开(公告)日：2010-12-28

    申请号：US12426713

    申请日：2009-04-20

    Applicant: Erik Roelof Loopstra ,  Leon Martin Levasier ,  Rene Oesterholt

    Inventor： Erik Roelof Loopstra ,  Leon Martin Levasier ,  Rene Oesterholt

    IPC: G01B11/14

    CPC classification number: G03F7/70775 ,  G03F7/70458 ,  G03F7/70516 ,  G03F9/7011 ,  G03F9/7019

    Abstract: A measurement system configured to measure a position of an object in a lithographic apparatus, includes at least three position detectors configured to detect the position of the object, the at least three position detectors each including a single or multi-dimensional optical encoder to provide at least six position values, the optical encoders being coupled to the object at different locations within a three dimensional coordinate system, wherein at least one position value is provided for each dimension of the three dimensional coordinate system, and wherein the measurement system is configured to calculate the position of the object within the three dimensional coordinate system from a subset of at least three of the six position values and to calculate an orientation of the object with respect to the three dimensional coordinate system from another subset of at least three of the six position values.

    Abstract translation: 被配置为测量光刻设备中的物体的位置的测量系统包括配置成检测物体的位置的至少三个位置检测器，所述至少三个位置检测器包括单个或多维光学编码器以提供在 至少六个位置值，所述光学编码器在三维坐标系内的不同位置处耦合到所述对象，其中为所述三维坐标系的每个维度提供至少一个位置值，并且其中所述测量系统被配置为计算 从六个位置值中的至少三个的子集的三维坐标系中的对象的位置，并且从六个位置中的至少三个的另一子集计算相对于三维坐标系的对象的取向 价值观。

    Lithographic apparatus and method for calibrating the same
    4.
    发明授权
    Lithographic apparatus and method for calibrating the same 有权
    平版印刷设备及其校准方法

    公开(公告)号：US07528965B2

    公开(公告)日：2009-05-05

    申请号：US11902786

    申请日：2007-09-25

    Applicant: Erik Roelof Loopstra ,  Leon Martin Levasier ,  Rene Oesterholt

    Inventor： Erik Roelof Loopstra ,  Leon Martin Levasier ,  Rene Oesterholt

    IPC: G01B11/14

    CPC classification number: G03F7/70775 ,  G03F7/70458 ,  G03F7/70516 ,  G03F9/7011 ,  G03F9/7019

    Abstract: A measurement system configured to measure a position of an object in a lithographic apparatus, includes at least three position detectors configured to detect the position of the object, the at least three position detectors each including a single or multi-dimensional optical encoder to provide at least six position values, the optical encoders being coupled to the object at different locations within a three dimensional coordinate system, wherein at least one position value is provided for each dimension of the three dimensional coordinate system, and wherein the measurement system is configured to calculate the position of the object within the three dimensional coordinate system from a subset of at least three of the six position values and to calculate an orientation of the object with respect to the three dimensional coordinate system from another subset of at least three of the six position values.

    Abstract translation: 被配置为测量光刻设备中的物体的位置的测量系统包括配置成检测物体的位置的至少三个位置检测器，所述至少三个位置检测器包括单个或多维光学编码器以提供在 至少六个位置值，所述光学编码器在三维坐标系内的不同位置处耦合到所述对象，其中为所述三维坐标系的每个维度提供至少一个位置值，并且其中所述测量系统被配置为计算 从六个位置值中的至少三个的子集的三维坐标系中的对象的位置，并且从六个位置中的至少三个的另一子集计算相对于三维坐标系的对象的取向 价值观。

    Using unflatness information of the substrate table or mask table for decreasing overlay
    5.
    发明申请
    Using unflatness information of the substrate table or mask table for decreasing overlay 有权
    使用衬底表或掩模台的不平坦信息减少重叠

    公开(公告)号：US20060114436A1

    公开(公告)日：2006-06-01

    申请号：US10998179

    申请日：2004-11-29

    Applicant: Rene Oesterholt ,  Ralph Brinkhof ,  Tjarko Van Empel ,  Leon Levasier ,  Joost Ottens ,  Koen Jacobus Zaal ,  Koenraad Stephan Salden

    Inventor： Rene Oesterholt ,  Ralph Brinkhof ,  Tjarko Van Empel ,  Leon Levasier ,  Joost Ottens ,  Koen Jacobus Zaal ,  Koenraad Stephan Salden

    IPC: G03B27/52

    CPC classification number: G03F7/70783 ,  G03F7/707

    Abstract: The invention relates to a lithographic system that includes an illumination system for providing a projection beam of radiation, a mask table for supporting a mask, the mask serving to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The system also comprises a processor arranged to calculate overlay corrections using a reference height map representing a surface of the substrate table or the mask table. The invention allows feed forward correction of non-flatness induced wafer grid distortion during alignment and during exposure, thereby reducing overlay errors caused by differences in flatness characteristics. It provides an indirect qualification method for overlay accuracy related to exposure chuck flatness based on height map information.

    Abstract translation: 本发明涉及一种光刻系统，其包括用于提供投影辐射束的照明系统，用于支撑掩模的掩模台，用于使投影光束在其横截面上具有图案的掩模，用于保持 基板和用于将图案化的光束投影到基板的目标部分上的投影系统。 该系统还包括处理器，其被布置为使用表示衬底台或掩模台的表面的参考高度图计算覆盖校正。 本发明允许在对准和曝光期间非平坦度引起的晶片格栅失真的前馈校正，从而减少由平坦度特性的差异引起的重叠误差。 它提供了基于高度图信息的与曝光卡盘平坦度相关的覆盖精度的间接鉴定方法。

    Lithographic apparatus and method for calibrating the same
    10.
    发明授权
    Lithographic apparatus and method for calibrating the same 有权
    平版印刷设备及其校准方法

    公开(公告)号：US08368902B2

    公开(公告)日：2013-02-05

    申请号：US12964483

    申请日：2010-12-09

    Applicant: Erik Roelof Loopstra ,  Leon Martin Levasier ,  Rene Oesterholt

    Inventor： Erik Roelof Loopstra ,  Leon Martin Levasier ,  Rene Oesterholt

    IPC: G01B11/14

    CPC classification number: G03F7/70775 ,  G03F7/70458 ,  G03F7/70516 ,  G03F9/7011 ,  G03F9/7019

    Abstract: A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.

    Abstract translation: 一种用于校准光刻设备中的编码器的方法，所述编码器包括传感器和光栅，所述编码器被配置为测量所述光刻设备的可移动支撑件的位置，所述方法包括使用干涉仪测量所述可移动支撑件的位置; 并且基于由干涉仪测量的可移动支撑件的位置来校准编码器。

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