发明申请
- 专利标题: SEMICONDUCTOR COMPONENT STRUCTURE WITH VERTICAL DIELECTRIC LAYERS
- 专利标题(中): 半导体元件结构与垂直电介质层
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申请号: US12984934申请日: 2011-01-05
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公开(公告)号: US20110101451A1公开(公告)日: 2011-05-05
- 发明人: Anton Mauder , Stefan Sedlmaier , Ralf Erichsen , Hans Weber , Oliver Haeberlen , Franz Hirler
- 申请人: Anton Mauder , Stefan Sedlmaier , Ralf Erichsen , Hans Weber , Oliver Haeberlen , Franz Hirler
- 申请人地址: AT Villach
- 专利权人: INFINEON TECHNOLOGIES AUSTRIA AG
- 当前专利权人: INFINEON TECHNOLOGIES AUSTRIA AG
- 当前专利权人地址: AT Villach
- 主分类号: H01L29/78
- IPC分类号: H01L29/78
摘要:
A semiconductor component having a semiconductor body having a first and a second side, an edge and an edge region adjacent to the edge in a lateral direction is described.
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