发明申请
US20110108525A1 METHOD AND SYSTEM FOR MANUFACTURING MICROSTRUCTURE IN PHOTOSENSITIVE GLASS SUBSTRATE
审中-公开
用于制造感光玻璃基板微结构的方法和系统
- 专利标题: METHOD AND SYSTEM FOR MANUFACTURING MICROSTRUCTURE IN PHOTOSENSITIVE GLASS SUBSTRATE
- 专利标题(中): 用于制造感光玻璃基板微结构的方法和系统
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申请号: US12768859申请日: 2010-04-28
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公开(公告)号: US20110108525A1公开(公告)日: 2011-05-12
- 发明人: Chih-Wei CHIEN , Chung-Wei Cheng , Ping-Xiang Li , Jeng-Shyong Chen
- 申请人: Chih-Wei CHIEN , Chung-Wei Cheng , Ping-Xiang Li , Jeng-Shyong Chen
- 申请人地址: TW Hsinchu
- 专利权人: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 当前专利权人: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 当前专利权人地址: TW Hsinchu
- 优先权: TW098138200 20091111
- 主分类号: B44C1/22
- IPC分类号: B44C1/22 ; C23F1/08
摘要:
The present invention provides a method and system for manufacturing a microstructure in a photosensitive glass substrate, which include the steps of generating first femtosecond laser pulses by a femtosecond laser source and focusing the first femtosecond laser pulses on a surface or an interior of the photosensitive glass substrate by a focus lens to define a modified region; generating second femtosecond laser pulses by the femtosecond laser source, adjusting a frequency of the second femtosecond laser pulses to be higher than that of the first femtosecond laser pulses by a frequency adjustment unit and an energy adjustment unit; focusing the adjusted second femtosecond laser pulses on the modified region of the photosensitive glass substrate to crystallize a substance of the modified region; and, after crystallization, etching off the crystallized region to obtain the microstructure in the photosensitive glass substrate.
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