发明申请
- 专利标题: SOLID-STATE IMAGING DEVICE, MANUFACTURING METHOD AND DESIGNING METHOD THEREOF, AND ELECTRONIC DEVICE
- 专利标题(中): 固态成像装置,制造方法及其设计方法及电子装置
-
申请号: US12915638申请日: 2010-10-29
-
公开(公告)号: US20110108705A1公开(公告)日: 2011-05-12
- 发明人: Kyoko Izuha , Hiromi Okazaki , Yoshiaki Kitano
- 申请人: Kyoko Izuha , Hiromi Okazaki , Yoshiaki Kitano
- 申请人地址: JP Tokyo
- 专利权人: SONY CORPORATION
- 当前专利权人: SONY CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2009-255445 20091106
- 主分类号: H01L27/146
- IPC分类号: H01L27/146 ; H01L31/0232 ; H01L31/18
摘要:
A solid-state imaging device includes: a semiconductor substrate that includes a photodiode separately provided for each of pixels disposed in a matrix on a light-receiving surface; a first insulating film formed on the semiconductor substrate so as to cover multilayer wiring formed on and in contact with the semiconductor substrate, wherein the first insulating film is formed using material of a first refractive index lower than a refractive index of the semiconductor substrate for at least bottom surface and top surface portions of the first insulating film; a second insulating film of a second refractive index higher than the first refractive index formed on the first insulating film; a third insulating film of a third refractive index higher than the second refractive index formed on the second insulating film; and a color filter formed on the third insulating film in a corresponding manner with each pixel so as to transmit light in a wavelength region of red, green, or blue.