Solid-state imaging device, driving method thereof and electronic apparatus
    1.
    发明授权
    Solid-state imaging device, driving method thereof and electronic apparatus 有权
    固态成像装置,其驱动方法和电子装置

    公开(公告)号:US08847135B2

    公开(公告)日:2014-09-30

    申请号:US13185170

    申请日:2011-07-18

    IPC分类号: H01L27/00 H01L27/146

    摘要: A solid-state imaging device includes: a semiconductor substrate including a light receiving surface which is divided according to pixels arranged in a matrix shape and is formed with a photoelectric converting section; an electrochromic film which is formed on the semiconductor substrate on a light incident path corresponding to the photoelectric converting section, in a portion of pixels selected from the pixels, and has light transmittance changing from a first transmittance to a second transmittance according to voltage applied thereto; a lower electrode which is formed below the electrochromic film; and an upper electrode which is formed above the electrochromic film.

    摘要翻译: 一种固态成像装置,包括:半导体衬底,其包括根据以矩阵形状排列的像素分割并形成有光电转换部的受光面; 在从所述像素中选择的像素的一部分中,在与所述光电转换部对应的光入射路径上形成在所述半导体基板上的电致变色膜,并且根据施加到所述电致变色膜的电压具有从第一透射率向第二透射率变化的透光率 ; 形成在电致变色膜下面的下电极; 以及形成在电致变色膜上方的上电极。

    Solid-state imaging device, manufacturing method and designing method thereof, and electronic device
    2.
    发明授权
    Solid-state imaging device, manufacturing method and designing method thereof, and electronic device 有权
    固态成像装置及其制造方法及其设计方法以及电子装置

    公开(公告)号:US08558158B2

    公开(公告)日:2013-10-15

    申请号:US12915638

    申请日:2010-10-29

    IPC分类号: H01L27/148 H01L31/0232

    摘要: A solid-state imaging device includes a semiconductor substrate, photodiodes, a first insulating film, a second insulating film, a third insulating film, and a color filter. The photodiodes are disposed on the semiconductor substrate. The first insulating film covers a multilayer wiring on the semiconductor substrate. The first insulating film comprises a material having a first refractive index lower than a refractive index of the semiconductor substrate for at least bottom surface and top surface portions of the first insulating film. The second insulating film has a second refractive index higher than the first refractive index. The third insulating film has a third refractive index higher than the second refractive index.

    摘要翻译: 固体摄像器件包括半导体衬底,光电二极管,第一绝缘膜,第二绝缘膜,第三绝缘膜和滤色器。 光电二极管设置在半导体衬底上。 第一绝缘膜覆盖半导体衬底上的多层布线。 第一绝缘膜包括至少第一绝缘膜的底表面和顶表面部分具有低于半导体衬底的折射率的第一折射率的材料。 第二绝缘膜具有比第一折射率高的第二折射率。 第三绝缘膜具有比第二折射率高的第三折射率。

    Pattern Verification Method, Pattern Verification System, Mask Manufacturing Method and Semiconductor Device Manufacturing Method
    3.
    发明申请
    Pattern Verification Method, Pattern Verification System, Mask Manufacturing Method and Semiconductor Device Manufacturing Method 审中-公开
    模式验证方法,模式验证系统,掩模制造方法和半导体器件制造方法

    公开(公告)号:US20120054695A1

    公开(公告)日:2012-03-01

    申请号:US13289630

    申请日:2011-11-04

    IPC分类号: G06F17/50

    CPC分类号: G03F7/70441 G03F1/36

    摘要: A pattern verification method comprising preparing a desired pattern and a mask pattern forming the desired pattern on a substrate, defining at least one evaluation point on an edge of the desired pattern, defining at least one process parameter to compute the transferred/formed pattern, defining a reference value and a variable range for each of the process parameters, computing a positional displacement for each first points corresponding to the evaluation point, first points computed using correction mask pattern and a plurality of combinations of parameter values obtained by varying the process parameters within the variable range or within the respective variable ranges, the positional displacement being displacement between first point and the evaluation point, computing a statistics of the positional displacements for each of the evaluation points, and outputting information modifying the mask pattern according to the statistics.

    摘要翻译: 一种图案验证方法,包括在衬底上制备期望图案和形成期望图案的掩模图案,在期望图案的边缘上限定至少一个评估点,限定至少一个工艺参数以计算所转印/形成的图案,定义 对于每个过程参数的参考值和可变范围,计算与评估点相对应的每个第一点的位置位移,使用校正掩模图案计算的第一点和通过改变其中的处理参数而获得的参数值的多个组合 可变范围或在各个可变范围内,位置偏移是第一点和评估点之间的位移,计算每个评估点的位置偏移的统计,以及根据统计信息输出修改掩模图案的信息。

    SOLID-STATE IMAGING DEVICE, DRIVING METHOD THEREOF AND ELECTRONIC APPARATUS
    4.
    发明申请
    SOLID-STATE IMAGING DEVICE, DRIVING METHOD THEREOF AND ELECTRONIC APPARATUS 有权
    固态成像装置,其驱动方法和电子装置

    公开(公告)号:US20120025061A1

    公开(公告)日:2012-02-02

    申请号:US13185170

    申请日:2011-07-18

    IPC分类号: H01L27/146 H01L31/0232

    摘要: A solid-state imaging device includes: a semiconductor substrate including a light receiving surface which is divided according to pixels arranged in a matrix shape and is formed with a photoelectric converting section; an electrochromic film which is formed on the semiconductor substrate on a light incident path corresponding to the photoelectric converting section, in a portion of pixels selected from the pixels, and has light transmittance changing from a first transmittance to a second transmittance according to voltage applied thereto; a lower electrode which is formed below the electrochromic film; and an upper electrode which is formed above the electrochromic film.

    摘要翻译: 一种固态成像装置,包括:半导体衬底,其包括根据以矩阵形状排列的像素分割并形成有光电转换部的受光面; 在从所述像素中选择的像素的一部分中,在与所述光电转换部对应的光入射路径上形成在所述半导体基板上的电致变色膜,并且根据施加到所述电致变色膜的电压具有从第一透射率向第二透射率变化的透光率 ; 形成在电致变色膜下面的下电极; 以及形成在电致变色膜上方的上电极。

    Method of determining photo mask, method of manufacturing semiconductor device, and computer program product
    5.
    发明授权
    Method of determining photo mask, method of manufacturing semiconductor device, and computer program product 失效
    确定光掩模的方法,制造半导体器件的方法以及计算机程序产品

    公开(公告)号:US07925090B2

    公开(公告)日:2011-04-12

    申请号:US11601797

    申请日:2006-11-20

    IPC分类号: G06K9/34

    CPC分类号: G03F7/70441

    摘要: A method of determining a photo mask, includes specifying a mask pattern for a photo mask for a first exposure apparatus, specifying a plurality of exposure conditions allowed to be set for a second exposure apparatus, predicting a projection image of the mask pattern to be projected on a substrate by the second exposure apparatus, for each of the exposure conditions, predicting a processed pattern to be formed on a substrate surface on the basis of the projection image, for each of the exposure conditions, determining whether or not the processed pattern meets a predetermined condition for each of the exposure conditions, and determining that the photo mask is applicable to the second exposure apparatus if the processed pattern meets the predetermined condition for at least one of the exposure conditions.

    摘要翻译: 一种确定光掩模的方法包括:为第一曝光装置指定用于光掩模的掩模图案,指定允许为第二曝光装置设置的多个曝光条件,预测要投影的掩模图案的投影图像 在第二曝光装置的基板上,对于每个曝光条件,对于每个曝光条件,基于投影图像预测要在基板表面上形成的处理图案,确定处理图案是否满足 对于每个曝光条件的预定条件,并且如果处理的图案满足至少一个曝光条件的预定条件,则确定光掩模适用于第二曝光装置。

    Method of determining photo mask, method of manufacturing semiconductor device, and computer program product
    7.
    发明申请
    Method of determining photo mask, method of manufacturing semiconductor device, and computer program product 失效
    确定光掩模的方法,制造半导体器件的方法以及计算机程序产品

    公开(公告)号:US20070130560A1

    公开(公告)日:2007-06-07

    申请号:US11601797

    申请日:2006-11-20

    IPC分类号: G06F17/50

    CPC分类号: G03F7/70441

    摘要: A method of determining a photo mask, includes specifying a mask pattern for a photo mask for a first exposure apparatus, specifying a plurality of exposure conditions allowed to be set for a second exposure apparatus, predicting a projection image of the mask pattern to be projected on a substrate by the second exposure apparatus, for each of the exposure conditions, predicting a processed pattern to be formed on a substrate surface on the basis of the projection image, for each of the exposure conditions, determining whether or not the processed pattern meets a predetermined condition for each of the exposure conditions, and determining that the photo mask is applicable to the second exposure apparatus if the processed pattern meets the predetermined condition for at least one of the exposure conditions.

    摘要翻译: 一种确定光掩模的方法包括:为第一曝光装置指定用于光掩模的掩模图案,指定允许为第二曝光装置设置的多个曝光条件,预测要投影的掩模图案的投影图像 在第二曝光装置的基板上,对于每个曝光条件,对于每个曝光条件,基于投影图像预测要在基板表面上形成的处理图案,确定处理图案是否满足 对于每个曝光条件的预定条件,并且如果处理的图案满足至少一个曝光条件的预定条件,则确定光掩模适用于第二曝光装置。

    Photomask having a focus monitor pattern

    公开(公告)号:US07108945B2

    公开(公告)日:2006-09-19

    申请号:US10396309

    申请日:2003-03-26

    IPC分类号: G01F9/00

    CPC分类号: G03F7/70641 G03F1/44

    摘要: A photomask has a device pattern, which has an opening portion and a mask portion, and either a focus monitor pattern or an exposure dose monitor pattern, which has an opening portion and a mask portion and which has the same plane pattern shape as at least a partial region of a device pattern. The phase difference in transmitted exposure light between the opening portion and the mask portion of the focus monitor pattern is different from that between the opening portion and the mask portion of the device pattern. The opening portion of the exposure dose monitor pattern has a different exposure dose transmittance from that of the opening portion of the device pattern.