发明申请
- 专利标题： ANTIMONY COMPOUNDS USEFUL FOR DEPOSITION OF ANTIMONY-CONTAINING MATERIALS
- 专利标题（中）： 用于沉积含有抗菌材料的抗微生物化合物
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申请号： US12990459申请日： 2009-04-30
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公开(公告)号： US20110111556A1公开(公告)日： 2011-05-12
- 发明人: Tianniu Chen , William Hunks , Philip S.H. Chen , Chongying Xu , Leah Maylott
- 申请人： Tianniu Chen , William Hunks , Philip S.H. Chen , Chongying Xu , Leah Maylott
- 申请人地址： US CT Danbury
- 专利权人： Advanced Technology Materials, Inc.
- 当前专利权人： Advanced Technology Materials, Inc.
- 当前专利权人地址： US CT Danbury
- 国际申请： PCT/US09/42290 WO 20090430
- 主分类号： H01L21/06
- IPC分类号： H01L21/06 ; C07F9/90 ; C09D7/12
摘要：
Precursors for use in depositing antimony-containing films on substrates such as wafers or other microelectronic device substrates, as well as associated processes of making and using such precursors, and source packages of such precursors. The precursors are useful for deposition of A Ge2Sb2Te5 chalcogenide thin films in the manufacture of nonvolatile Phase Change Memory (PCM) or for the manufacturing of thermoelectric devices, by deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD).
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