发明申请
US20110123936A1 RESIST PATTERN COATING AGENT AND RESIST PATTERN-FORMING METHOD
审中-公开
电阻图案涂料和电阻图案形成方法
- 专利标题： RESIST PATTERN COATING AGENT AND RESIST PATTERN-FORMING METHOD
- 专利标题（中）： 电阻图案涂料和电阻图案形成方法
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申请号： US13022560申请日： 2011-02-07
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公开(公告)号： US20110123936A1公开(公告)日： 2011-05-26
- 发明人: Masafumi HORI , Michihiro Mita , Kouichi Fujiwara , Katsuhiko Hieda , Yoshikazu Yamaguchi , Tomohiro Kakizawa
- 申请人： Masafumi HORI , Michihiro Mita , Kouichi Fujiwara , Katsuhiko Hieda , Yoshikazu Yamaguchi , Tomohiro Kakizawa
- 申请人地址： JP Tokyo
- 专利权人： JSR Corporation
- 当前专利权人： JSR Corporation
- 当前专利权人地址： JP Tokyo
- 优先权： JP2008-240545 20080919
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; C08L61/28 ; C08L33/26 ; C08L41/00
摘要：
A resist pattern coating agent includes a hydroxyl group-containing resin, a solvent, and at least two compounds including at least two groups shown by a following formula (1), compounds including a group shown by a following formula (2), and compounds including a group shown by a following formula (4).