摘要:
A resist pattern coating agent includes a hydroxyl group-containing resin, a solvent, and at least two compounds including at least two groups shown by a following formula (1), compounds including a group shown by a following formula (2), and compounds including a group shown by a following formula (4).
摘要:
A resist pattern-insolubilizing resin composition is used in a resist pattern-forming method. The resist pattern-insolubilizing resin composition includes solvent and a resin. The resin includes a first repeating unit that includes a hydroxyl group in its side chain and at least one of a second repeating unit derived from a monomer shown by a following formula (1-1) and a third repeating unit derived from a monomer shown by a following formula (1-2), wherein for example, R1 represents a hydrogen atom, A represents a methylene group, R2 represents a group shown by a following formula (2-1) or a group shown by a following formula (2-2), R3 represents a methylene group, R4 represents a hydrogen atom, and n is 0 or 1, wherein each of R34 represents at least one of a hydrogen atom and a linear or branched alkyl group having 1 to 10 carbon atoms.
摘要:
A resist pattern-insolubilizing resin composition is used in a resist pattern-forming method. The resist pattern-insolubilizing resin composition includes solvent and a resin. The resin includes a first repeating unit that includes a hydroxyl group in its side chain and at least one of a second repeating unit derived from a monomer shown by a following formula (1-1) and a third repeating unit derived from a monomer shown by a following formula (1-2), wherein for example, R1 represents a hydrogen atom, A represents a methylene group, R2 represents a group shown by a following formula (2-1) or a group shown by a following formula (2-2), R3 represents a methylene group, R4 represents a hydrogen atom, and n is 0 or 1, wherein each of R34 represents at least one of a hydrogen atom and a linear or branched alkyl group having 1 to 10 carbon atoms.
摘要:
An acrylic copolymer having a specific structure and a radiation-sensitive resin composition comprising the acrylic copolymer having high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, dry etching resistance, and pattern shape, and, in particular, excelling in forming contact holes and lines-and-spaces.
摘要:
To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R′, R″ and R′″ are each hydrogen, methyl, or trifluoromethyl; R1 is hydrogen, C1-4 linear or branched alkyl, alkoxy, or C1-4 linear or branched fluoroalkyl; X is a C7-20 polycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; R2 and R3 are each independently C1-4 linear or branched alkyl; R4 is a C4-20 alicyclic hydrocarbon group; R5 is C1-4 linear or branched alkyl; and R6 and R7 are each hydrogen or C1-4 linear or branched alkyl.
摘要翻译:提供一种在抗蚀剂溶剂中溶解性优异且几乎不依赖于烘烤温度的抗蚀剂,并且可以形成线边缘粗糙度减小的显影图案。 一种丙烯酸类聚合物,其特征在于包含通式(1)的单元,通式(2)的单元和通式(3)的单元和/或通式(4)的单元,其中R,R',R' '和R“'分别是氢,甲基或三氟甲基; R 1是氢,C 1-4 - 直链或支链烷基,烷氧基或C 1-4 - 直链或支链氟代烷基; X是由碳原子和氢原子组成的C 7-20多环脂族烃基; R 2和R 3各自独立地为C 1-4 - 直链或支链烷基; R 4是C 4-20脂肪族烃基; R 5是C 1-4烷基直链或支链烷基; 和R 6和R 7各自为氢或C 1-4 - 直链或支链烷基。
摘要:
An acrylic copolymer having a specific structure and a radiation-sensitive resin composition comprising the acrylic copolymer having high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, dry etching resistance, and pattern shape, and, in particular, excelling in forming contact holes and lines-and-spaces.
摘要:
Indexes indicative of the locations of lamp clips are formed on a chassis where lamps are juxtaposed with different juxtaposition pitches. The lamp clips comprise: plate-like bases; holding portions, which are provided at one face of the bases, for holding the lamps; and markers corresponding to the indexes.
摘要:
This invention provides a method or device for determining the stage of chronic kidney disease.The present invention relates to a method for determining a stage of chronic kidney disease in a subject suffering from kidney disease, the method comprising the steps of: (A-1) measuring the content of at least one marker selected from the group consisting of markers (1) to (16) in a specimen from the subject, (B-1) determining the stage indicated by each marker by comparing the content of the at least one marker in the specimen from the subject, which has been measured in step (A-1), with a reference content range determined in each stage, and (C-1) determining that when each marker indicates the same stage, which has been determined in step (A-1), the chronic kidney disease in the subject is in that stage.
摘要:
In a chassis which has a lid plate closing an opening portion of a frame part and in which a plurality of lamps are juxtaposed, the lid plate includes a plurality of plate bodies juxtaposed with their end parts superposed on each other and a connecting unit connects the superposed end parts of the plate bodies and the superposed end parts of the plate bodies, respectively.
摘要:
To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R′, R″ and R′″ are each hydrogen, methyl, or trifluoromethyl; R1 is hydrogen, C1-4 linear or branched alkyl, alkoxy, or C1-4 linear or branched fluoroalkyl; X is a C7-20 polycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; R2 and R3 are each independently C1-4 linear or branched alkyl; R4 is a C4-20 alicyclic hydrocarbon group; R5 is C1-4 linear or branched alkyl; and R6 and R7 are each hydrogen or C1-4 linear or branched alkyl.