Invention Application
- Patent Title: METHOD OF TUNING PROPERTIES OF THIN FILMS
- Patent Title (中): 调整薄膜特性的方法
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Application No.: US12958105Application Date: 2010-12-01
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Publication No.: US20110133129A1Publication Date: 2011-06-09
- Inventor: Makoto MURAKAMI , Zhendong HU , Bing LIU
- Applicant: Makoto MURAKAMI , Zhendong HU , Bing LIU
- Applicant Address: US MI Ann Arbor
- Assignee: IMRA America, Inc.
- Current Assignee: IMRA America, Inc.
- Current Assignee Address: US MI Ann Arbor
- Main IPC: H01B1/00
- IPC: H01B1/00 ; C23C26/00 ; H05H1/24 ; B05C11/00

Abstract:
A method of tuning thin film properties using pulsed laser deposition (PLD) by tuning laser parameters is provided. Various embodiments may be utilized to tune magnetic properties, conductivity or other physical properties. Some embodiments may improve performance of electrochemical devices, for example a thin film electrode may be fabricated resulting in improved reaction speed of a Li ion battery. By way of example, a material property of thin film is tuned by setting a pulse duration. In some embodiments the numbers of laser pulses and laser pulse energy are other laser parameters which may be utilized to tune the film properties. The materials that can be synthesized using various embodiments of the invention include, but are not limited to, metals and metal oxides.
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