发明申请
US20110136346A1 Substantially Non-Oxidizing Plasma Treatment Devices and Processes
审中-公开
基本无氧化等离子体处理装置及工艺
- 专利标题： Substantially Non-Oxidizing Plasma Treatment Devices and Processes
- 专利标题（中）： 基本无氧化等离子体处理装置及工艺
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申请号： US12631117申请日： 2009-12-04
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公开(公告)号： US20110136346A1公开(公告)日： 2011-06-09
- 发明人: Phillip Geissbühler , Ivan Berry , Armin Huseinovic , Shijian Luo , Aseem Kumar Srivastava , Carlo Waldfried
- 申请人： Phillip Geissbühler , Ivan Berry , Armin Huseinovic , Shijian Luo , Aseem Kumar Srivastava , Carlo Waldfried
- 申请人地址： US MA Beverly
- 专利权人： AXCELIS TECHNOLOGIES, INC.
- 当前专利权人： AXCELIS TECHNOLOGIES, INC.
- 当前专利权人地址： US MA Beverly
- 主分类号： H01L21/3065
- IPC分类号： H01L21/3065 ; G03F7/42 ; B08B7/00
摘要：
Non-oxidizing plasma treatment devices for treating a semiconductor workpiece generally include a substantially non-oxidizing gas source; a plasma generating component in fluid communication with the non-oxidizing gas source; a process chamber in fluid communication with the plasma generating component, and an exhaust conduit centrally located in a bottom wall of the process chamber. In one embodiment, the process chamber is formed of an aluminum alloy containing less than 0.15% copper by weight; In other embodiments, the process chamber includes a coating of a non-copper containing material to prevent formation of copper hydride during processing with substantially non-oxidizing plasma. In still other embodiments, the process chamber walls are configured to be heated during plasma processing. Also disclosed are non-oxidizing plasma processes.
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