发明申请
- 专利标题： ADJUSTING SUBSTRATE TEMPERATURE TO IMPROVE CD UNIFORMITY
- 专利标题（中）： 调整基板温度以提高光盘的均匀性
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申请号： US12966506申请日： 2010-12-13
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公开(公告)号： US20110143462A1公开(公告)日： 2011-06-16
- 发明人: Keith William Gaff , Harmeet Singh , Keith Comendant , Vahid Vahedi
- 申请人： Keith William Gaff , Harmeet Singh , Keith Comendant , Vahid Vahedi
- 申请人地址： US CA Fremont
- 专利权人： Lam Research Corporation
- 当前专利权人： Lam Research Corporation
- 当前专利权人地址： US CA Fremont
- 主分类号： H01L21/3065
- IPC分类号： H01L21/3065 ; H01L21/66
摘要：
A plasma etching system having a substrate support assembly with multiple independently controllable heater zones. The plasma etching system is configured to control etching temperature of predetermined locations so that pre-etch and/or post-etch non-uniformity of critical device parameters can be compensated for.
公开/授权文献
- US08642480B2 Adjusting substrate temperature to improve CD uniformity 公开/授权日：2014-02-04
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