发明申请
- 专利标题： POLYSILANE PRODUCTION PROCESS
- 专利标题（中）： 多晶生产工艺
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申请号： US13003700申请日： 2009-07-09
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公开(公告)号： US20110158886A1公开(公告)日： 2011-06-30
- 发明人: Tatsuya Shimoda , Ryo Kawajiri , Kiyoshi Isobe , Hidetaka Nakai , Yasuo Matsuki
- 申请人： Tatsuya Shimoda , Ryo Kawajiri , Kiyoshi Isobe , Hidetaka Nakai , Yasuo Matsuki
- 申请人地址： JP Kawaguchi-shi, Saitama JP Kanazawa-shi, Ishikawa JP Tokyo
- 专利权人： JAPAN SCIENCE AND TECHNOLOGY AGENCY,National Univ. Corp. Kanazawa University,JSR CORPORATION
- 当前专利权人： JAPAN SCIENCE AND TECHNOLOGY AGENCY,National Univ. Corp. Kanazawa University,JSR CORPORATION
- 当前专利权人地址： JP Kawaguchi-shi, Saitama JP Kanazawa-shi, Ishikawa JP Tokyo
- 优先权： JP2008-181583 20080711
- 国际申请： PCT/JP2009/062842 WO 20090709
- 主分类号： C01B33/04
- IPC分类号： C01B33/04
摘要：
A polysilane production process comprising reacting a specific silane compound typified by a cyclic silane compound represented by the following formula (2) in the presence of a binuclear metal complex represented by the following formula (4). SijH2j (2) (in the formula (2), j is an integer of 3 to 10.) [CpM(μ-CH2)]2 (4) (in the formula (4), Cp is a cyclopentadienyl-based ligand, M is a metal atom selected from Rh and Ir, and the bond between M's is a double bond.)
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