发明申请
- 专利标题： FEEDFORWARD TEMPERATURE CONTROL FOR PLASMA PROCESSING APPARATUS
- 专利标题（中）： 等离子体加工设备的前级温度控制
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申请号： US12905624申请日： 2010-10-15
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公开(公告)号： US20110186545A1公开(公告)日： 2011-08-04
- 发明人: Chetan MAHADESWARASWAMY , Walter R. MERRY , Sergio Fukuda SHOJI , Chunlei ZHANG , Yashaswini B. PATTAR , Duy D. NGUYEN , Tina TSONG , Shane C. NEVIL , Douglas A. BUCHBERGER, JR. , Fernando M. SILVEIRA , Brad L. MAYS , Kartik RAMASWAMY , Hamid NOORBAKHSH
- 申请人： Chetan MAHADESWARASWAMY , Walter R. MERRY , Sergio Fukuda SHOJI , Chunlei ZHANG , Yashaswini B. PATTAR , Duy D. NGUYEN , Tina TSONG , Shane C. NEVIL , Douglas A. BUCHBERGER, JR. , Fernando M. SILVEIRA , Brad L. MAYS , Kartik RAMASWAMY , Hamid NOORBAKHSH
- 申请人地址： US CA Santa Clara
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： C23F1/08
- IPC分类号： C23F1/08 ; C23F1/00 ; C23C16/50 ; C23C16/458 ; C23C16/52 ; G05D23/00
摘要：
Methods and systems for controlling temperatures in plasma processing chamber with reduced controller response times and increased stability. Temperature control is based at least in part on a feedforward control signal derived from a plasma power input into the processing chamber. A feedforward control signal compensating disturbances in the temperature attributable to the plasma power may be combined with a feedback control signal counteracting error between a measured and desired temperature.
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