发明申请
- 专利标题： LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRAPHIC METHOD
- 专利标题（中）： 光栅设备，可编程格式设备和光刻方法
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申请号： US13119884申请日： 2009-09-21
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公开(公告)号： US20110188016A1公开(公告)日： 2011-08-04
- 发明人: Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin Johan Van Zwet
- 申请人： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin Johan Van Zwet
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 国际申请： PCT/IB2009/054135 WO 20090921
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.
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