发明申请
- 专利标题: Apparatus for producing trichlorosilane and method for producing trichlorosilane
- 专利标题(中): 三氯硅烷的制造装置及三氯硅烷的制造方法
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申请号: US12929789申请日: 2011-02-16
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公开(公告)号: US20110200510A1公开(公告)日: 2011-08-18
- 发明人: Naoya Murakami , Wataru Saiki
- 申请人: Naoya Murakami , Wataru Saiki
- 申请人地址: JP Tokyo
- 专利权人: MITSUBISHI MATERIALS CORPORATION
- 当前专利权人: MITSUBISHI MATERIALS CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2010-032999 20100217
- 主分类号: B01J19/00
- IPC分类号: B01J19/00 ; C01B33/107
摘要:
An apparatus for producing trichlorosilane, including: a reaction vessel that has a substantially cylindrical wall body, a top plate, and a bottom plate, where a reaction product gas is produced from a raw gas supplied to the reaction vessel through a gas introducing passage provided to the lower section of the cylindrical wall body; and a plurality of heaters that are disposed inside the reaction vessel to heat the raw gas, wherein each of the heaters has a heating element that is elongated in a vertical direction and generates heat by electrification, and a mount that is fixed to the bottom plate and supports the heating element; a flange is provided to intermediate height of the heating element such that the flange is arranged upper than the gas introducing passage and is elongated in horizontal direction; and a passage of the raw gas formed between adjacent heaters is narrowed by the flange.
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