发明申请
- 专利标题: SIDEWALL COATING FOR NON-UNIFORM SPIN MOMENTUM-TRANSFER MAGNETIC TUNNEL JUNCTION CURRENT FLOW
- 专利标题(中): 非均匀旋转磁场转移磁性隧道结电流流动的侧壁涂层
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申请号: US13100123申请日: 2011-05-03
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公开(公告)号: US20110204459A1公开(公告)日: 2011-08-25
- 发明人: Michael C. GAIDIS
- 申请人: Michael C. GAIDIS
- 申请人地址: US NY ARMONK
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORP.
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORP.
- 当前专利权人地址: US NY ARMONK
- 主分类号: H01L29/82
- IPC分类号: H01L29/82
摘要:
A magnetic tunnel junction device comprises a substrate including a patterned wiring layer. A magnetic tunnel junction (MTJ) stack is formed over the wiring layer. A low-conductivity layer is formed over the MTJ stack and a conductive hard mask is formed thereon. A spacer material is then deposited that includes a different electrical conductivity than the low conductivity layer. The spacer material is etched from horizontal surfaces so that the spacer material remains only on sidewalls of the hard mask and a stud. A further etch process leaves behind the sidewall-spacer material as a conductive link between a free magnetic layer and the conductive hard mask, around the low-conductivity layer. A difference in electrical conductivity between the stud and the spacer material enhances current flow along the edges of the free layer within the MTJ stack and through the spacer material formed on the sidewalls.