发明申请
US20110206839A1 METHOD AND APPARATUS FOR FORMING STRUCTURES OF POLYMER NANOBEADS
审中-公开
形成聚合物纳米粒子结构的方法和装置
- 专利标题: METHOD AND APPARATUS FOR FORMING STRUCTURES OF POLYMER NANOBEADS
- 专利标题(中): 形成聚合物纳米粒子结构的方法和装置
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申请号: US12746044申请日: 2009-01-05
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公开(公告)号: US20110206839A1公开(公告)日: 2011-08-25
- 发明人: Vladimir Bulovic , Murali Chaparala , Jianglong Chen , Eric Wing -Jing Lam , Valerie Leblanc , Martin A. Schmidt
- 申请人: Vladimir Bulovic , Murali Chaparala , Jianglong Chen , Eric Wing -Jing Lam , Valerie Leblanc , Martin A. Schmidt
- 申请人地址: US MA Cambridge
- 专利权人: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
- 当前专利权人: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
- 当前专利权人地址: US MA Cambridge
- 国际申请: PCT/US2009/030151 WO 20090105
- 主分类号: B05D5/06
- IPC分类号: B05D5/06 ; B05C11/00
摘要:
The disclosure relates to providing printed structures of polymer that have substantially flat printed surfaces. In one embodiment, the disclosure relates to a post-printing treatment apparatus for receiving a substrate supporting a polymer printing thereon. The polymer can be PMMA or other suitable polymer. In a related embodiment, the polymer defines a thermoplastic polymer having a glass transition temperature. The apparatus can comprise of a chamber, and input manifold, an exhaust manifold, a solvent reservoir and a gas reservoir. The solvent reservoir provides one or more solvent systems adapted to chemically bind, and potentially react, with the polymer. The gas reservoir provides one or more gases for drying the substrate and printed polymer after the solvent treatment step. In one application, a substrate having printed surface thereon is placed in the chamber and exposed to the solvent system for sufficient period of time to provide substantially flat print surfaces.
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