发明申请
- 专利标题： METHOD FOR PRODUCING A SEMICONDUCTOR COMPONENT, SEMICONDUCTOR COMPONENT AND INTERMEDIATE PRODUCT IN THE PRODUCTION THEREOF
- 专利标题（中）： 生产半导体元件，半导体元件及其生产中的中间产品的方法
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申请号： US12673244申请日： 2008-08-12
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公开(公告)号： US20110210428A1公开(公告)日： 2011-09-01
- 发明人: Bernd Bitnar , Holger Neuhaus , Andreas Krause
- 申请人： Bernd Bitnar , Holger Neuhaus , Andreas Krause
- 优先权： DE102007038744.1 20070816
- 国际申请： PCT/EP2008/006624 WO 20080812
- 主分类号： H01L21/02
- IPC分类号： H01L21/02 ; H01L21/28 ; H01L23/48
摘要：
Method for producing semiconductor components with a contact structure having a high aspect ratio comprising the following steps: providing an essentially plane semiconductor substrate having a first side and a second side, applying a mask onto at least a first partial area on at least one of the sides of the semiconductor substrate and applying a contact structure onto at least a second partial area, which is different from first partial area, on at least one of the sides of semiconductor substrate.
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