发明申请
- 专利标题: CONFORMAL LAYERS BY RADICAL-COMPONENT CVD
- 专利标题(中): 通过放射性元素CVD的合适层
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申请号: US13024487申请日: 2011-02-10
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公开(公告)号: US20110217851A1公开(公告)日: 2011-09-08
- 发明人: Jingmei Liang , Xiaolin Chen , DongQing Li , Nitin K. Ingle
- 申请人: Jingmei Liang , Xiaolin Chen , DongQing Li , Nitin K. Ingle
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 主分类号: H01L21/31
- IPC分类号: H01L21/31
摘要:
Methods, materials, and systems are described for forming conformal dielectric layers containing silicon and nitrogen (e.g., a silicon-nitrogen-hydrogen (Si—N—H) film) from a carbon-free silicon-and-nitrogen precursor and radical-nitrogen precursor. The carbon-free silicon-and-nitrogen precursor is predominantly excited by contact with the radical-nitrogen precursor. Because the silicon-and-nitrogen film is formed without carbon, the conversion of the film into hardened silicon oxide is done with less pore formation and less volume shrinkage. The deposited silicon-and-nitrogen-containing film may be wholly or partially converted to silicon oxide which allows the optical properties of the conformal dielectric layer to be selectable. The deposition of a thin silicon-and-nitrogen-containing film may be performed at low temperature to form a liner layer in a substrate trench. The low temperature liner layer has been found to improve the wetting properties and allows flowable films to more completely fill the trench.
公开/授权文献
- US08563445B2 Conformal layers by radical-component CVD 公开/授权日:2013-10-22