发明申请
- 专利标题: Off-Axis Silicon Carbide Substrates
- 专利标题(中): 离轴碳化硅基板
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申请号: US12966753申请日: 2010-12-13
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公开(公告)号: US20110220915A1公开(公告)日: 2011-09-15
- 发明人: James Edgar , Michael Dudley , Martin Kuball , Yi Zhang , Guan Wang , Hui Chen , Yu Zhang
- 申请人: James Edgar , Michael Dudley , Martin Kuball , Yi Zhang , Guan Wang , Hui Chen , Yu Zhang
- 主分类号: H01L29/24
- IPC分类号: H01L29/24 ; C30B25/02 ; C30B25/18 ; H01L29/22 ; H01L29/04 ; H01L21/20
摘要:
A method of epitaxial growth of a material on a crystalline substrate includes selecting a substrate having a crystal plane that includes a plurality of terraces with step risers that join adjacent terraces. Each terrace of the plurality or terraces presents a lattice constant that substantially matches a lattice constant of the material, and each step riser presents a step height and offset that is consistent with portions of the material nucleating on adjacent terraces being in substantial crystalline match at the step riser. The method also includes preparing a substrate by exposing the crystal plane; and epitaxially growing the material on the substrate such that the portions of the material nucleating on adjacent terraces merge into a single crystal lattice without defects at the step risers.
公开/授权文献
- US08823014B2 Off-axis silicon carbide substrates 公开/授权日:2014-09-02
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