发明申请
- 专利标题： COMPONENT OF AN IMMERSION SYSTEM, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
- 专利标题（中）： 静态系统的组件，静态平铺设备和设备制造方法
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申请号： US13094243申请日： 2011-04-26
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公开(公告)号： US20110287371A1公开(公告)日： 2011-11-24
- 发明人: Nina Vladimirovna DZIOMKINA , Johannes Henricus Wilhelmus Jacobs , Michel Riepen , Fabrizio Evangelista
- 申请人： Nina Vladimirovna DZIOMKINA , Johannes Henricus Wilhelmus Jacobs , Michel Riepen , Fabrizio Evangelista
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03B27/52 ; B05D3/06
摘要：
A component of an immersion system of a lithographic apparatus is disclosed having a superhydrophobic surface which in use is not exposed to DUV radiation. Also, there is disclosed a surface of a lithographic apparatus which may come into contact with immersion liquid and is a threshold distance from a surface exposed in use to the projection beam has a superhydrophobic property.
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