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公开(公告)号：US09632435B2
公开(公告)日：2017-04-25
申请号：US13046211
申请日：2011-03-11
申请人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
发明人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
CPC分类号： G03F7/70875 , G03F7/7085
摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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2.发明授权公开(公告)号：US09188880B2
公开(公告)日：2015-11-17
申请号：US13288831
申请日：2011-11-03
申请人： Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G03F7/20
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
摘要翻译： 描述了一种光刻设备，其具有液体供应系统，其配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳空间内的液体的阻挡构件和加热器。
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公开(公告)号：US08976334B2
公开(公告)日：2015-03-10
申请号：US13240908
申请日：2011-09-22
申请人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70808
摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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公开(公告)号：US08780321B2
公开(公告)日：2014-07-15
申请号：US12631113
申请日：2009-12-04
申请人： Thijs Egidius Johannes Knaapen , Richard Joseph Bruls , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Martijn Hendrik Kamphuis , Paulus Martinus Maria Liebregts , Rudolf Adrianus Joannes Maas , Marco Koert Stavenga , Coen Cornelis Wilhelmus Verspaget , Rudy Jan Maria Pellens , Jan Cornelis Van Der Hoeven , David Lucien Anstotz , Gert-Jan Gerardus Johannes Thomas Brands , Marcus Johannes Van Der Zanden , Vijay Kumar Badam , Casper Roderik De Groot
发明人： Thijs Egidius Johannes Knaapen , Richard Joseph Bruls , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Martijn Hendrik Kamphuis , Paulus Martinus Maria Liebregts , Rudolf Adrianus Joannes Maas , Marco Koert Stavenga , Coen Cornelis Wilhelmus Verspaget , Rudy Jan Maria Pellens , Jan Cornelis Van Der Hoeven , David Lucien Anstotz , Gert-Jan Gerardus Johannes Thomas Brands , Marcus Johannes Van Der Zanden , Vijay Kumar Badam , Casper Roderik De Groot
CPC分类号： G03F7/70925 , G03B27/52 , G03F7/70341
摘要： A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
摘要翻译： 公开了一种具有包括目标和/或传感器的台面和使用局部气流从目标和/或传感器移置液体的液体移位装置的光刻设备。 液体置换装置可以定位在各种位置，例如， 安装在曝光站处的液体处理装置，在曝光站和测量站之间，在负载/卸载站处或与传感器相邻的传送路径。
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公开(公告)号：US20140022527A1
公开(公告)日：2014-01-23
申请号：US14036991
申请日：2013-09-25
申请人： Engelbertus Antonius Fransiscus VAN DER PASCH , Joost Jeroen Ottens , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , William Peter Van Drent , Frank Staals , Lukasz Jerzy Macht , Erik Willem Bogaart
发明人： Engelbertus Antonius Fransiscus VAN DER PASCH , Joost Jeroen Ottens , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , William Peter Van Drent , Frank Staals , Lukasz Jerzy Macht , Erik Willem Bogaart
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70833 , G03F7/709
摘要： A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.
摘要翻译： 一种光刻设备，包括基板台位置测量系统和用于分别测量基板台和投影系统的位置的投影系统位置测量系统。 衬底台位置测量系统包括安装在衬底台上的衬底台参考元件和第一传感器头。 衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。 保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。 投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。 传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。
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公开(公告)号：US08416395B2
公开(公告)日：2013-04-09
申请号：US12436635
申请日：2009-05-06
申请人： Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Frits Van der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
发明人： Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Frits Van der Meulen , Joost Jeroen Ottens , Anko Jozef Cornelus Sijben , Wouterus Johannes Petrus Maria Maas , Hendrikus Johannes Marinus Van Abeelen , Henricus Petrus Versteijnen , Paula Steffens
摘要： A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.
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公开(公告)号：US08259287B2
公开(公告)日：2012-09-04
申请号：US12081168
申请日：2008-04-11
申请人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70808
摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
摘要翻译： 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化，并且提取器包括被配置为使振动最小化的出口阵列。
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8.发明授权Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid 有权平版印刷设备，装置制造方法以及用于对液体进行排气的装置公开(公告)号：US08107053B2
公开(公告)日：2012-01-31
申请号：US12198448
申请日：2008-08-26
申请人： Martinus Cornelis Maria Verhagen , Roelof Frederik De Graaf , Johannes Henricus Wilhelmus Jacobs , Franciscus Johannes Herman Maria Teunissen , Jurgen Benischek
发明人： Martinus Cornelis Maria Verhagen , Roelof Frederik De Graaf , Johannes Henricus Wilhelmus Jacobs , Franciscus Johannes Herman Maria Teunissen , Jurgen Benischek
CPC分类号： G03F7/70341
摘要： An apparatus configured to de-gas a liquid includes a semi-permeable membrane having a first side on which the liquid is provided; and (i) a vaporizer configured to provide vapor of the liquid to a second side of the membrane; or (ii) a gas inlet configured to provide a gas to the second side of the membrane, the gas adapted to dissociate when dissolved in the liquid and an ion exchanger for the liquid downstream of the semi-permeable membrane.
摘要翻译： 一种被配置为对液体进行除气的装置包括具有第一侧的半透膜，液体在其上设置有第一侧; 和（i）蒸发器，其构造成将液体的蒸气提供到膜的第二侧; 或（ii）配置成向膜的第二侧提供气体的气体入口，适于在溶解在液体中时解离的气体和用于半渗透膜下游液体的离子交换器。
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公开(公告)号：US20120008118A1
公开(公告)日：2012-01-12
申请号：US13242125
申请日：2011-09-23
申请人： Marcel BECKERS , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人： Marcel BECKERS , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
IPC分类号： G03B27/52
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70808
摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
摘要翻译： 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化，并且提取器包括被配置为使振动最小化的出口阵列。
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公开(公告)号：US20110273679A1
公开(公告)日：2011-11-10
申请号：US13187086
申请日：2011-07-20
申请人： Thijs Egidius Johannes Knaapen , Richard Joseph Bruls , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Martijn Hendrik Kamphuis , Paulus Martinus Maria Liebregts , Rudolf Adrianus Joannes Maas , Marco Koert Stavenga , Coen Cornelis Wilhelmus Verspaget , Rudy Jan Maria Pellens , Jan Cornelis Van Der Hoeven , David Lucien Anstotz , Gert-Jan Gerardus Johannes Thomas Brands , Marcus Johannes Van Der Zanden , Vijay Kumar Badam , Casper Roderik De Groot
发明人： Thijs Egidius Johannes Knaapen , Richard Joseph Bruls , Youri Johannes Laurentius Maria Van Dommelen , Johannes Henricus Wilhelmus Jacobs , Martijn Hendrik Kamphuis , Paulus Martinus Maria Liebregts , Rudolf Adrianus Joannes Maas , Marco Koert Stavenga , Coen Cornelis Wilhelmus Verspaget , Rudy Jan Maria Pellens , Jan Cornelis Van Der Hoeven , David Lucien Anstotz , Gert-Jan Gerardus Johannes Thomas Brands , Marcus Johannes Van Der Zanden , Vijay Kumar Badam , Casper Roderik De Groot
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03B27/52 , G03F7/70341
摘要： A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
摘要翻译： 公开了一种具有包括目标和/或传感器的台面和使用局部气流从目标和/或传感器移置液体的液体移位装置的光刻设备。 液体置换装置可以定位在各种位置，例如， 安装在曝光站处的液体处理装置，在曝光站和测量站之间，在负载/卸载站处或与传感器相邻的传送路径。
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