发明申请
US20110291066A1 Nonvolatile Memory Devices Having Cells with Oxygen Diffusion Barrier Layers Therein and Methods of Manufacturing the Same 有权
具有氧扩散阻挡层的电池的非易失性存储器件及其制造方法

  • 专利标题: Nonvolatile Memory Devices Having Cells with Oxygen Diffusion Barrier Layers Therein and Methods of Manufacturing the Same
  • 专利标题(中): 具有氧扩散阻挡层的电池的非易失性存储器件及其制造方法
  • 申请号: US13150596
    申请日: 2011-06-01
  • 公开(公告)号: US20110291066A1
    公开(公告)日: 2011-12-01
  • 发明人: In-gyu BaekMyung-jong KimYong-ho Ha
  • 申请人: In-gyu BaekMyung-jong KimYong-ho Ha
  • 优先权: KR10-2010-0051963 20100601
  • 主分类号: H01L47/00
  • IPC分类号: H01L47/00
Nonvolatile Memory Devices Having Cells with Oxygen Diffusion Barrier Layers Therein and Methods of Manufacturing the Same
摘要:
A nonvolatile memory cell includes first and second electrodes and a data storage layer extending between the first and second electrodes. An oxygen diffusion barrier layer is provided, which extends between the data storage layer and the first electrode. An oxygen gettering layer is also provided, which extends between the oxygen diffusion barrier layer and the data storage layer. The oxygen diffusion barrier layer includes aluminum oxide, the oxygen gettering layer includes titanium, the data storage layer includes a metal oxide, such as magnesium oxide, and at least one of the first and second electrodes includes a material selected from a group consisting of tungsten, polysilicon, aluminum, titanium nitride silicide and conductive nitrides.
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