发明申请
- 专利标题: Photoelectric Conversion Device, Manufacturing Method Thereof And Semiconductor Device
- 专利标题(中): 光电转换装置及其制造方法及半导体装置
-
申请号: US13206544申请日: 2011-08-10
-
公开(公告)号: US20110291090A1公开(公告)日: 2011-12-01
- 发明人: Yuusuke Sugawara , Kazuo Nishi , Tatsuya Arao , Daiki Yamada , Hidekazu Takahashi , Naoto Kusumoto
- 申请人: Yuusuke Sugawara , Kazuo Nishi , Tatsuya Arao , Daiki Yamada , Hidekazu Takahashi , Naoto Kusumoto
- 申请人地址: JP Kanagawa-ken
- 专利权人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人地址: JP Kanagawa-ken
- 优先权: JP2005-148583 20050520
- 主分类号: H01L31/0376
- IPC分类号: H01L31/0376
摘要:
A manufacturing method of a photoelectric conversion device includes the following steps: forming a first electrode over a substrate; and, over the first electrode, forming a photoelectric conversion layer that includes a first conductive layer having one conductivity, a second semiconductor layer, and a third semiconductor layer having a conductivity opposite to the one conductivity of the second semiconductor layer over the first electrode. The manufacturing method further includes the step of removing a part of the second semiconductor layer and a part of the third semiconductor layer in a region of the photoelectric conversion layer so that the third semiconductor layer does not overlap the first electrode.
公开/授权文献
- US08207591B2 Photoelectric conversion device 公开/授权日:2012-06-26
信息查询
IPC分类: