发明申请
- 专利标题: METHODS AND APPARATUS FOR AN ISFET
- 专利标题(中): 用于ISFET的方法和装置
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申请号: US12794591申请日: 2010-06-04
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公开(公告)号: US20110299337A1公开(公告)日: 2011-12-08
- 发明人: Patrice M. Parris , Weize Chen , Richard J. De Souza , Md M. Hoque , John M. McKenna
- 申请人: Patrice M. Parris , Weize Chen , Richard J. De Souza , Md M. Hoque , John M. McKenna
- 申请人地址: US TX Austin
- 专利权人: Freescale Semiconductor, Inc.
- 当前专利权人: Freescale Semiconductor, Inc.
- 当前专利权人地址: US TX Austin
- 主分类号: G11C16/04
- IPC分类号: G11C16/04 ; H01L21/28 ; H01L27/108
摘要:
An ISFET includes a control gate coupled to a floating gate in a CMOS device. The control gate, for example, a poly-to-well capacitor, is configured to receive a bias voltage and effect movement of a trapped charge between the control gate and the floating gate. The threshold voltage of the ISFET can therefore by trimmed to a predetermined value, thereby storing the trim information (the amount of trapped charge in the floating gate) within the ISFET itself.
公开/授权文献
- US08878257B2 Methods and apparatus for an ISFET 公开/授权日:2014-11-04
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