发明申请
- 专利标题： METHOD AND APPARATUS FOR PROCESSING SEMICONDUCTOR WORK PIECES
- 专利标题（中）： 用于处理半导体工作的方法和装置
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申请号： US13016742申请日： 2011-01-28
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公开(公告)号： US20110305544A1公开(公告)日： 2011-12-15
- 发明人: AiHua Chen , Ryoji Todaka , Gerald Yin
- 申请人： AiHua Chen , Ryoji Todaka , Gerald Yin
- 优先权： CN200510028563.2 20050805
- 主分类号： H01L21/67
- IPC分类号： H01L21/67 ; H05B3/06
摘要：
A processing apparatus for semiconductor work pieces and related methodology is disclosed and which includes a processing chamber having an internal cavity, and which has a plurality of rotatable processing stations positioned therein and wherein the rotatable processing stations each process a semiconductor work piece.
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