发明申请
US20110318674A1 PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME
有权
PHOTOMASK BLANK，PHOTOMASK及其制造方法
- 专利标题： PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME
- 专利标题（中）： PHOTOMASK BLANK，PHOTOMASK及其制造方法
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申请号： US13223140申请日： 2011-08-31
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公开(公告)号： US20110318674A1公开(公告)日： 2011-12-29
- 发明人: Masahiro HASHIMOTO , Hiroyuki IWASHITA , Atsushi KOMINATO
- 申请人： Masahiro HASHIMOTO , Hiroyuki IWASHITA , Atsushi KOMINATO
- 申请人地址： JP Tokyo
- 专利权人： HOYA CORPORATION
- 当前专利权人： HOYA CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2008-093517 20080331
- 主分类号： G03F1/14
- IPC分类号： G03F1/14 ; G03F1/08
摘要：
A photomask blank has a light shieldable film formed on a light transmitting substrate. The light shieldable film has a light shielding layer which is formed of molybdenum silicide metal containing molybdenum in a content greater than 20 atomic % and not greater than 40 atomic % and which has a thickness smaller than 40 nm, an antireflection layer formed on the light shielding layer in contact with the light shielding layer and formed of a molybdenum silicide compound containing at least one of oxygen and nitrogen, and a low reflection layer formed under the light shielding layer in contact with the light shielding layer.
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