发明申请
- 专利标题： METHODS, STRUCTURES, AND DESIGN STRUCTURES FOR IMPROVED ADHESION OF PROTECTIVE LAYERS OF IMAGER MICROLENS STRUCTURES
- 专利标题（中）： 改善胶片微结构保护层粘结的方法，结构和设计结构
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申请号： US12841750申请日： 2010-07-22
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公开(公告)号： US20120018832A1公开(公告)日： 2012-01-26
- 发明人: Edward C. COONEY, III , Jeffrey P. GAMBINO , Robert K. LEIDY , Charles F. MUSANTE , John G. TWOMBLY
- 申请人： Edward C. COONEY, III , Jeffrey P. GAMBINO , Robert K. LEIDY , Charles F. MUSANTE , John G. TWOMBLY
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 主分类号： H01L31/0232
- IPC分类号： H01L31/0232 ; G06F17/50 ; H01L21/30 ; H01L31/18
摘要：
Methods, structures, and design structures for improved adhesion of protective layers of imager microlens structures are disclosed. A method of fabricating a semiconductor structure includes forming an interfacial region between a microlens and a protective oxide layer. The interfacial region has a lower concentration of oxygen than the protective oxide layer.
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