发明申请
US20120018856A1 Semiconductor Device With Drift Regions and Compensation Regions 有权
具有漂移区域和补偿区域的半导体器件

Semiconductor Device With Drift Regions and Compensation Regions
摘要:
Disclosed is a method of forming a semiconductor device with drift regions of a first doping type and compensation regions of a second doping type, and a semiconductor device with drift regions of a first doping type and compensation regions of a second doping type.
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