Invention Application
US20120025404A1 FILM FOR FLIP CHIP TYPE SEMICONDUCTOR BACK SURFACE 有权
片状薄膜型半导体背面膜

FILM FOR FLIP CHIP TYPE SEMICONDUCTOR BACK SURFACE
Abstract:
The present invention relates to a film for flip chip type semiconductor back surface to be formed on the back surface of a semiconductor element flip chip-connected to an adherend, the film for flip chip type semiconductor back surface having a tensile storage elastic modulus at 25° C. after thermal curing within a range of from 10 GPa to 30 GPa, in which the tensile storage elastic modulus at 25° C. after thermal curing of the film for flip chip type semiconductor back surface falls within a range of from 4 times to 20 times the tensile storage elastic modulus at 25° C. before thermal curing thereof.
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