发明申请
US20120043551A1 Second contact schottky metal layer to improve GaN schottky diode performance
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第二接触肖特基金属层提高GaN肖特基二极管性能
- 专利标题: Second contact schottky metal layer to improve GaN schottky diode performance
- 专利标题(中): 第二接触肖特基金属层提高GaN肖特基二极管性能
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申请号: US13200206申请日: 2011-09-21
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公开(公告)号: US20120043551A1公开(公告)日: 2012-02-23
- 发明人: Ting Gang Zhu , Marek Pabisz
- 申请人: Ting Gang Zhu , Marek Pabisz
- 申请人地址: US CA San Jose
- 专利权人: Power Integrations, Inc.
- 当前专利权人: Power Integrations, Inc.
- 当前专利权人地址: US CA San Jose
- 主分类号: H01L29/20
- IPC分类号: H01L29/20 ; H01L29/205
摘要:
A Schottky diode includes a first nitride-based semiconductor layer disposed atop a substrate. A second nitride-based semiconductor layer is disposed atop a portion of the first nitride-based semiconductor layer. The second layer has a doping concentration lower than that of the first layer. A first Schottky contact metal layer having a first metal work function is disposed on a top planar surface of the second layer, forming a first Schottky junction. A second Schottky contact metal layer having a second metal work function is disposed atop of and laterally surrounding the first Schottky contact metal layer, the metal work function of the second metal layer is higher than that of the first metal layer. A metal layer disposed on first and second planar surfaces forms an ohmic contact with the first nitride-based semiconductor layer.
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