发明申请
- 专利标题： SHOWERHEAD ELECTRODES AND SHOWERHEAD ELECTRODE ASSEMBLIES HAVING LOW-PARTICLE PERFORMANCE FOR SEMICONDUCTOR MATERIAL PROCESSING APPARATUSES
- 专利标题（中）： 具有半导体材料加工设备的低颗粒性能的淋浴电极和淋浴电极组件
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申请号： US13284297申请日： 2011-10-28
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公开(公告)号： US20120045902A1公开(公告)日： 2012-02-23
- 发明人: Andreas Fischer , Rajinder Dhindsa
- 申请人： Andreas Fischer , Rajinder Dhindsa
- 申请人地址： US CA Fremont
- 专利权人： Lam Research Corporation
- 当前专利权人： Lam Research Corporation
- 当前专利权人地址： US CA Fremont
- 主分类号： C23F1/08
- IPC分类号： C23F1/08 ; H01L21/30 ; H01L21/3065
摘要：
Showerhead electrodes for a semiconductor material processing apparatus are disclosed. An embodiment of the showerhead electrodes includes top and bottom electrodes bonded to each other. The top electrode includes one or more plenums. The bottom electrode includes a plasma-exposed bottom surface and a plurality of gas holes in fluid communication with the plenum. Showerhead electrode assemblies including a showerhead electrode flexibly suspended from a top plate are also disclosed. The showerhead electrode assemblies can be in fluid communication with temperature-control elements spatially separated from the showerhead electrode to control the showerhead electrode temperature. Methods of processing substrates in plasma processing chambers including the showerhead electrode assemblies are also disclosed.
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