Invention Application
- Patent Title: DEFECT INSPECTION AND PHOTOLUMINESCENCE MEASUREMENT SYSTEM
- Patent Title (中): 缺陷检验和光致发光测量系统
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Application No.: US12861894Application Date: 2010-08-24
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Publication No.: US20120049085A1Publication Date: 2012-03-01
- Inventor: Roman Sappey , Steven W. Meeks
- Applicant: Roman Sappey , Steven W. Meeks
- Applicant Address: US CA Milpitas
- Assignee: KLA-TENCOR CORPORATION
- Current Assignee: KLA-TENCOR CORPORATION
- Current Assignee Address: US CA Milpitas
- Main IPC: G01J1/58
- IPC: G01J1/58 ; G01N21/55 ; G01J3/00 ; G01N21/00

Abstract:
A system for defect detection and photoluminescence measurement of a sample may include a radiation source configured to target radiation to the sample. The system may also include an optics assembly positioned above the sample to receive a sample radiation. The system may also include a filter module configured to receive the sample radiation collected by the optics assembly. The filter module may separate the sample radiation collected by the optics assembly into a first radiation portion and a second radiation portion. The system may also include a defect detection module configured to receive the first radiation portion from the filter module. The system may further include a photoluminescence measurement module configured to receive the second radiation portion from the filter module. The defect detection module and the photoluminescence measurement module may be configured to receive the respective first radiation portion and the second radiation portion substantially simultaneously.
Public/Granted literature
- US09163987B2 Defect inspection and photoluminescence measurement system Public/Granted day:2015-10-20
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