公开(公告)号：US20120049085A1

公开(公告)日：2012-03-01

申请号：US12861894

申请日：2010-08-24

Applicant: Roman Sappey ,  Steven W. Meeks

Inventor： Roman Sappey ,  Steven W. Meeks

IPC: G01J1/58 ,  G01N21/55 ,  G01J3/00 ,  G01N21/00

CPC classification number: G01J3/36 ,  G01J3/4412 ,  G01N21/6489 ,  G01N21/9501

Abstract: A system for defect detection and photoluminescence measurement of a sample may include a radiation source configured to target radiation to the sample. The system may also include an optics assembly positioned above the sample to receive a sample radiation. The system may also include a filter module configured to receive the sample radiation collected by the optics assembly. The filter module may separate the sample radiation collected by the optics assembly into a first radiation portion and a second radiation portion. The system may also include a defect detection module configured to receive the first radiation portion from the filter module. The system may further include a photoluminescence measurement module configured to receive the second radiation portion from the filter module. The defect detection module and the photoluminescence measurement module may be configured to receive the respective first radiation portion and the second radiation portion substantially simultaneously.

Abstract translation: 用于样品的缺陷检测和光致发光测量的系统可以包括被配置为将辐射靶向样品的辐射源。 该系统还可以包括位于样品上方以接收样品辐射的光学组件。 该系统还可以包括被配置为接收由光学组件收集的样品辐射的滤波器模块。 过滤器模块可以将由光学组件收集的样品辐射分离成第一辐射部分和第二辐射部分。 该系统还可以包括被配置为从过滤器模块接收第一辐射部分的缺陷检测模块。 该系统可以进一步包括光致发光测量模块，其被配置为从过滤器模块接收第二辐射部分。 缺陷检测模块和光致发光测量模块可以被配置为基本上同时地接收相应的第一辐射部分和第二辐射部分。

公开(公告)号：US09163987B2

公开(公告)日：2015-10-20

申请号：US12861894

申请日：2010-08-24

Applicant: Roman Sappey ,  Steven W. Meeks

Inventor： Roman Sappey ,  Steven W. Meeks

IPC: F21V9/16 ,  G01J3/36 ,  G01J3/44 ,  G01N21/64 ,  G01N21/95

CPC classification number: G01J3/36 ,  G01J3/4412 ,  G01N21/6489 ,  G01N21/9501

Abstract: A system for defect detection and photoluminescence measurement of a sample may include a radiation source configured to target radiation to the sample. The system may also include an optics assembly positioned above the sample to receive a sample radiation. The system may also include a filter module configured to receive the sample radiation collected by the optics assembly. The filter module may separate the sample radiation collected by the optics assembly into a first radiation portion and a second radiation portion. The system may also include a defect detection module configured to receive the first radiation portion from the filter module. The system may further include a photoluminescence measurement module configured to receive the second radiation portion from the filter module. The defect detection module and the photoluminescence measurement module may be configured to receive the respective first radiation portion and the second radiation portion substantially simultaneously.

Abstract translation: 用于样品的缺陷检测和光致发光测量的系统可以包括被配置为将辐射靶向样品的辐射源。 该系统还可以包括位于样品上方以接收样品辐射的光学组件。 该系统还可以包括被配置为接收由光学组件收集的样品辐射的滤波器模块。 过滤器模块可以将由光学组件收集的样品辐射分离成第一辐射部分和第二辐射部分。 该系统还可以包括被配置为从过滤器模块接收第一辐射部分的缺陷检测模块。 该系统可以进一步包括光致发光测量模块，其被配置为从过滤器模块接收第二辐射部分。 缺陷检测模块和光致发光测量模块可以被配置为基本上同时地接收相应的第一辐射部分和第二辐射部分。

公开(公告)号：US20160033421A1

公开(公告)日：2016-02-04

申请号：US14449058

申请日：2014-07-31

Applicant: Steven W. Meeks ,  Ronny Soetarman

Inventor： Steven W. Meeks ,  Ronny Soetarman

IPC: G01N21/958 ,  G01N21/47

CPC classification number: G01N21/958 ,  G01N21/47 ,  G01N2021/4711 ,  G01N2021/4735

Abstract: A method and apparatus to measure specular reflection intensity, specular reflection angle, near specular scattered radiation, and large angle scattered radiation and determine the location and type of defect present in a first and a second transparent solid that have abutting surfaces. The types of defects include a top surface particle, an interface particle, a bottom surface particle, an interface bubble, a top surface pit, and a stain. The four measurements are conducted at multiple locations along the surface of the transparent solid and the measured information is stored in a memory device. The difference between an event peak and a local average of measurements for each type of measurement is used to detect changes in the measurements. Information stored in the memory device is processed to generate a work piece defect mapping indicating the type of defect and the defect location of each defect found.

Abstract translation: 测量镜面反射强度，镜面反射角，近镜面散射辐射和大角度散射辐射的方法和装置，并确定存在于具有邻接表面的第一和第二透明固体中的缺陷的位置和类型。 缺陷的类型包括顶表面颗粒，界面颗粒，底表面颗粒，界面气泡，顶表面凹坑和污渍。 四个测量在透明固体的表面的多个位置处进行，并且将测量的信息存储在存储器件中。 事件峰值和每种测量类型的局部测量平均值之间的差异用于检测测量的变化。 存储在存储器件中的信息被处理以产生指示缺陷类型和找到的每个缺陷的缺陷位置的工件缺陷映射。

公开(公告)号：US20140218722A1

公开(公告)日：2014-08-07

申请号：US13757154

申请日：2013-02-01

Applicant: Steven W. Meeks ,  Rusmin Kudinar ,  Hung P. Nguyen

Inventor： Steven W. Meeks ,  Rusmin Kudinar ,  Hung P. Nguyen

IPC: G01N21/01 ,  G02B26/12 ,  G02B26/10

CPC classification number: G01N21/01 ,  G01N21/55 ,  G02B26/10 ,  G02B26/125

Abstract: An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a first and second lens, a field stop, and a detector. The radiating source irradiates a first position of on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a sample. The first lens focuses scattered radiation from the sample to generate multiple scan lines at a first focal plane. The field stop is positioned at the first focal plane to block one or more scan lines at the first focal plane. The scan line not blocked by the field stop propagates to the second lens. The second lens de-scans the scan line and generates a point of scattered radiation at a second focal plane where the detector input is located.

Abstract translation: 光学检查器包括辐射源，时变光束反射器，远心扫描透镜，第一和第二透镜，场停止和检测器。 辐射源用源光束照射时变光束反射器上的第一位置。 时变光束反射器将源光束引导到远心扫描透镜，然后将远光扫描透镜引导到源样品。 第一透镜聚焦来自样品的散射辐射，以在第一焦平面处产生多条扫描线。 场停止件位于第一焦平面处以阻挡在第一焦平面处的一个或多个扫描线。 不被场停止阻挡的扫描线传播到第二个镜头。 第二透镜扫描扫描线并在检测器输入所位于的第二焦平面处产生散射辐射点。

公开(公告)号：US20130308124A1

公开(公告)日：2013-11-21

申请号：US13472421

申请日：2012-05-15

Applicant: Mahendra Prabhu Ramachandran ,  Steven W. Meeks ,  Romain Sappey

Inventor： Mahendra Prabhu Ramachandran ,  Steven W. Meeks ,  Romain Sappey

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/47 ,  G01N21/8422 ,  G01N21/956 ,  G01N21/95623 ,  G01N21/958

Abstract: Various embodiments for substrate inspection are provided.

Abstract translation: 提供了用于基板检查的各种实施例。

公开(公告)号：US20110019197A1

公开(公告)日：2011-01-27

申请号：US12822253

申请日：2010-06-24

Applicant: Steven W. Meeks

Inventor： Steven W. Meeks

IPC: G01N21/55

CPC classification number: G01N21/474 ,  G01N21/9501

Abstract: An apparatus for detecting top scattered light from a substrate. A source directs a light onto a position on the substrate. The light thereby reflects off in a specular beam, scatters off the top surface, and scatters off a bottom surface of the substrate. An objective receives the top and bottom scattered light. The objective has a first focal point focused on the position on the top surface of the substrate, and a second focal point focused on a pinhole field stop. The pinhole field stop passes the top scattered light that is focused on the pinhole field stop, and blocks the bottom scattered light. A sensor receives and quantifies the top scattered light.

Abstract translation: 一种用于检测来自基底的顶部散射光的装置。 源将光引导到基板上的位置。 因此，光在镜面光束中反射，从顶表面散射，并从衬底的底部表面散射。 目标接收顶部和底部散射光。 该目标具有集中在基板的顶表面上的位置的第一焦点和聚焦在针孔场停止件上的第二焦点。 针孔场停止通过聚焦在针孔场挡板上的顶部散射光，并阻挡底部散射光。 传感器接收并量化顶部散射光。

公开(公告)号：US07397553B1

公开(公告)日：2008-07-08

申请号：US11257234

申请日：2005-10-24

Applicant: Courosh Mehanian ,  Steven W. Meeks ,  Eliezer Rosengaus

Inventor： Courosh Mehanian ,  Steven W. Meeks ,  Eliezer Rosengaus

IPC: G01N21/00 ,  G01J4/00

CPC classification number: G01B11/0641 ,  G01B11/303 ,  G01N21/8851 ,  G01N21/9501

Abstract: In one embodiment, a surface scanning system comprises a radiation directing assembly that scans a surface using a Cartesian scanning pattern; and a radiation collecting assembly that collects radiation reflected from the surface. A scattered radiation collection system is included that measures the scattered light from the surface.

Abstract translation: 在一个实施例中，表面扫描系统包括使用笛卡尔扫描图案扫描表面的辐射导向组件; 以及收集从表面反射的辐射的辐射收集组件。 包括散射辐射收集系统，用于测量表面散射光。

公开(公告)号：US07123357B2

公开(公告)日：2006-10-17

申请号：US10444652

申请日：2003-05-22

Applicant: Steven W. Meeks

Inventor： Steven W. Meeks

IPC: G01N21/00

CPC classification number: G01N21/211 ,  G01B11/0616 ,  G01B11/0641 ,  G01B11/065 ,  G01B11/303 ,  G01B11/306 ,  H01L22/12

Abstract: Scratches, pits and particles which are smaller or larger than the beam size may be measured and identified by single and multiple beam techniques. In one embodiment, the invention uses a pair of orthogonally oriented laser beams, one in the radial and one in the circumferential direction. In another embodiment, two pairs of orthogonally oriented laser beams are used. The scattered light from radial and circumferential beams allows the detection and classification of particles, pits and scratches. In other embodiments, single beam techniques are used to classify radial and circumferential defects.

Abstract translation: 小于或大于光束尺寸的划痕，凹坑和颗粒可以通过单光束和多光束技术来测量和识别。 在一个实施例中，本发明使用一对正交定向的激光束，一个在径向上，一个在周向上。 在另一个实施例中，使用两对正交定向的激光束。 来自径向和圆周波束的散射光允许检测和分类颗粒，凹坑和划痕。 在其他实施例中，使用单光束技术对径向和周向缺陷进行分类。

公开(公告)号：US06956660B2

公开(公告)日：2005-10-18

申请号：US10782267

申请日：2004-02-18

Applicant: Steven W. Meeks ,  Rusmin Kudinar

Inventor： Steven W. Meeks ,  Rusmin Kudinar

IPC: G01B11/06 ,  G01B11/30 ,  G01Q60/00 ,  G01B11/28

CPC classification number: G01B11/065 ,  G01B11/303

Abstract: A system and method for measuring a phase difference between first and second reflected polarized light signal components, including transmitting a first incident light signal toward a first object, wherein the first object is a magnetic disk and/or a glass substrate. Seperating from a reflected light signal, a first mixed reflected polarized light signal component having a first phase and a second mixed reflected polarized light signal component having a second phase that is different from said first phase, wherein said mixed reflected polarized light signal components comprises both P-polarized and S-polarized light relative to a plane of incidence of said reflected light signal. Detecting the intensities of said first and second mixed reflected polarized light signal components, and determining a difference in phase between said first and second mixed reflected polarized light signal component based upon said first and second intensities.

Abstract translation: 一种用于测量第一和第二反射偏振光信号分量之间的相位差的系统和方法，包括向第一物体发射第一入射光信号，其中第一物体是磁盘和/或玻璃衬底。 从反射光信号分离出具有第一相位的第一混合反射偏振光信号分量和具有与所述第一相位不同的第二相位的第二混合反射偏振光信号分量，其中所述混合反射偏振光信号分量包括 P偏振光和S偏振光相对于所述反射光信号的入射平面。 检测所述第一和第二混合反射偏振光信号分量的强度，并且基于所述第一和第二强度确定所述第一和第二混合反射偏振光信号分量之间的相位差。

公开(公告)号：US06781103B1

公开(公告)日：2004-08-24

申请号：US10406075

申请日：2003-04-02

Applicant: Gale A. Lane ,  Steven W. Meeks

Inventor： Gale A. Lane ,  Steven W. Meeks

IPC: G02B2740

CPC classification number: G02B7/32

Abstract: A method is provided for automatically focusing a light signal on a surface of a substrate. The method is independent of the substrate material and is effective for both opaque and transparent substrates. A method is also provided for calibrating a system to allow for automatic focusing of a light signal.

Abstract translation: 提供了一种用于将光信号自动聚焦在基板的表面上的方法。 该方法独立于衬底材料，并且对于不透明和透明衬底都是有效的。 还提供了一种用于校准系统以允许光信号的自动聚焦的方法。