Invention Application
- Patent Title: SHOWERHEAD FOR FILM DEPOSITING VACUUM EQUIPMENT
- Patent Title (中): 薄膜沉积真空设备的淋浴
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Application No.: US13375434Application Date: 2010-05-13
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Publication No.: US20120067971A1Publication Date: 2012-03-22
- Inventor: Chulsoo Byun , Man Cheol Han , II Yong Chung , Seok Woo Lee
- Applicant: Chulsoo Byun , Man Cheol Han , II Yong Chung , Seok Woo Lee
- Applicant Address: JP Chungcheongnam-do
- Assignee: Korea Institute of Industrial Tedhnology
- Current Assignee: Korea Institute of Industrial Tedhnology
- Current Assignee Address: JP Chungcheongnam-do
- Priority: KR10-2009-0048290 20090601
- International Application: PCT/KR2010/003024 WO 20100513
- Main IPC: B05B15/02
- IPC: B05B15/02

Abstract:
A showerhead for film-depositing vacuum equipment having an effect shortening the length of injection tubes for a reactive gas is presented. The injection tubes extend from the bottom of a reactive gas showerhead module, and two different kinds of reactive gases are mixed with an injection support gas within a reactive showerhead module so as to inject the mixed gas. The showerhead for film-depositing vacuum equipment includes the reactive gas showerhead module above a cooling jacket and a purge gas showerhead module above the reactive gas showerhead module. The injection tubes of the reactive gas showerhead module pass through the cooling jacket disposed below the reactive gas showerhead module, and the injection tubes of the purge gas showerhead module pass through the reactive gas showerhead module disposed below the purge gas showerhead module, thereby enabling the purge gas to flow into a purge gas redistribution space defined above the cooling jacket.
Public/Granted literature
- US09315897B2 Showerhead for film depositing vacuum equipment Public/Granted day:2016-04-19
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