公开(公告)号：US08882913B2

公开(公告)日：2014-11-11

申请号：US12089695

申请日：2007-02-16

Applicant: Chul Soo Byun ,  Man Cheol Han

Inventor： Chul Soo Byun ,  Man Cheol Han

IPC: C23C16/455 ,  C23C16/40 ,  C23C16/00 ,  H01L21/67

CPC classification number: C23C16/45565 ,  C23C16/40 ,  C23C16/45514 ,  C23C16/45572 ,  C23C16/45574 ,  C23C16/45578 ,  H01L21/67069

Abstract: The present invention is related to an apparatus and a method for chemical vapor deposition (CVD) using a showerhead through which a reactive gas of at least one kind and a purge gas is injected over a substrate on which a film is growing. A plural number of reactive gas showerhead modules are laid on a purge gas showerhead module. Each reactive gas is injected from a bottom of the showerhead after flowing through the showerhead as separated, thereby preventing the reactive gases from causing homogeneous gas phase reactions and from generating unwanted particles at the inside of the showerhead. And a purge gas is injected from the bottom surface of the showerhead by forming a protective curtain, thereby suppressing diffusion of the reactive gas injected backwardly. Each reactive gas is mixed with an injection support gas which is a kind of inert gas in a mixing zone at inside of the showerhead, where the injection velocity of each reactive gas is regulated positively by the amount of the injection support gas mixed. The present invention further includes an apparatus and a method, wherein the showerhead is cooled by a cooling jacket which keeps the temperature of the showerhead at proper levels to prevent both the condensation and the thermal decomposition of the reactive gas used.

Abstract translation: 本发明涉及一种使用喷头的化学气相沉积（CVD）的装置和方法，通过该喷头，将至少一种反应性气体和净化气体喷射到其上生长薄膜的基板上。 多个反应气体淋浴喷头模块被放置在吹扫气喷头模块上。 每个反应气体在分离后流过喷头后从喷头的底部注入，从而防止反应气体引起均匀的气相反应并在喷头内部产生不需要的颗粒。 并且通过形成保护帘从喷头的底面注入吹扫气体，从而抑制向后注入的反应气体的扩散。 每个反应气体与在喷头内部的混合区域中的一种惰性气体的注入支持气体混合，其中每个反应气体的注射速度受到混合的注射支持气体的量的积极调节。 本发明还包括一种装置和方法，其中喷头由冷却套冷却，冷却套将喷头的温度保持在适当的水平，以防止所用反应气体的冷凝和热分解。

公开(公告)号：US20090169744A1

公开(公告)日：2009-07-02

申请号：US12089695

申请日：2007-02-16

Applicant: Chul Soo Byun ,  Man Cheol Han

Inventor： Chul Soo Byun ,  Man Cheol Han

IPC: C23C16/18

CPC classification number: C23C16/45565 ,  C23C16/40 ,  C23C16/45514 ,  C23C16/45572 ,  C23C16/45574 ,  C23C16/45578 ,  H01L21/67069

Abstract: The present invention is related to an apparatus and a method for chemical vapor deposition (CVD) using a showerhead through which a reactive gas of at least one kind and a purge gas is injected over a substrate on which a film is growing. A plural number of reactive gas showerhead modules are laid on a purge gas showerhead module. Each reactive gas is injected from a bottom of the showerhead after flowing through the showerhead as separated, thereby preventing the reactive gases from causing homogeneous gas phase reactions and from generating unwanted particles at the inside of the showerhead. And purge gas is injected from the bottom surface of the showerhead by forming a protective curtain, thereby suppressing diffusion of the reactive gas injected backwardly. Each reactive gas is mixed with an injection support gas which is a kind of inert gas in a mixing zone at inside of the showerhead, where the injection velocity of each reactive gas is regulated positively by the amount of the injection support gas mixed. The present invention further includes an apparatus and a method, wherein the showerhead is cooled by a cooling jacket which keeps the temperature of the showerhead at proper levels to prevent both the condensation and the thermal decomposition of the reactive gas used.

Abstract translation: 本发明涉及一种使用喷头的化学气相沉积（CVD）的装置和方法，通过该喷头，将至少一种反应性气体和净化气体喷射到其上生长薄膜的基板上。 多个反应气体淋浴喷头模块被放置在吹扫气喷头模块上。 每个反应气体在分离后流过喷头后从喷头的底部注入，从而防止反应气体引起均匀的气相反应并在喷头内部产生不需要的颗粒。 并且通过形成保护帘从喷头的底面注入吹扫气体，由此抑制向后注入的反应气体的扩散。 每个反应气体与在喷头内部的混合区域中的一种惰性气体的注入支持气体混合，其中每个反应气体的注射速度受到混合的注射支持气体的量的积极调节。 本发明还包括一种装置和方法，其中喷头由冷却套冷却，冷却套将喷头的温度保持在适当的水平，以防止所用反应气体的冷凝和热分解。

公开(公告)号：US09315897B2

公开(公告)日：2016-04-19

申请号：US13375434

申请日：2010-05-13

Applicant: Chulsoo Byun ,  Man Cheol Han ,  Il Yong Chung ,  Seok Woo Lee

Inventor： Chulsoo Byun ,  Man Cheol Han ,  Il Yong Chung ,  Seok Woo Lee

IPC: C23C16/455

CPC classification number: C23C16/45565 ,  C23C16/45563 ,  C23C16/45572 ,  C23C16/45574 ,  C23C16/45576 ,  C23C16/45591

Abstract: A showerhead for film-depositing vacuum equipment having an effect shortening the length of injection tubes for a reactive gas is presented. The injection tubes extend from the bottom of a reactive gas showerhead module, and two different kinds of reactive gases are mixed with an injection support gas within a reactive showerhead module so as to inject the mixed gas. The showerhead for film-depositing vacuum equipment includes the reactive gas showerhead module above a cooling jacket and a purge gas showerhead module above the reactive gas showerhead module. The injection tubes of the reactive gas showerhead module pass through the cooling jacket disposed below the reactive gas showerhead module, and the injection tubes of the purge gas showerhead module pass through the reactive gas showerhead module disposed below the purge gas showerhead module, thereby enabling the purge gas to flow into a purge gas redistribution space defined above the cooling jacket.

Abstract translation: 提出了一种用于成膜真空设备的喷头，其具有缩短反应气体的注射管的长度的效果。 注射管从反应性气体喷头模块的底部延伸，并且两种不同种类的反应气体与反应性喷头模块内的注射支撑气体混合，以便注入混合气体。 用于成膜真空设备的喷头包括在冷却套上方的反应性气体喷头模块和在反应性气体喷头模块上方的吹扫气喷头模块。 反应性气体喷头模块的注射管通过设置在反应性气体喷头模块下方的冷却套管，并且吹扫气体喷头模块的注射管通过布置在吹扫气喷头模块下方的反应性气体喷头模块， 吹扫气体流入冷却套管上方定义的净化气体再分布空间。

公开(公告)号：US20120067971A1

公开(公告)日：2012-03-22

申请号：US13375434

申请日：2010-05-13

Applicant: Chulsoo Byun ,  Man Cheol Han ,  II Yong Chung ,  Seok Woo Lee

Inventor： Chulsoo Byun ,  Man Cheol Han ,  II Yong Chung ,  Seok Woo Lee

IPC: B05B15/02

CPC classification number: C23C16/45565 ,  C23C16/45563 ,  C23C16/45572 ,  C23C16/45574 ,  C23C16/45576 ,  C23C16/45591

Abstract: A showerhead for film-depositing vacuum equipment having an effect shortening the length of injection tubes for a reactive gas is presented. The injection tubes extend from the bottom of a reactive gas showerhead module, and two different kinds of reactive gases are mixed with an injection support gas within a reactive showerhead module so as to inject the mixed gas. The showerhead for film-depositing vacuum equipment includes the reactive gas showerhead module above a cooling jacket and a purge gas showerhead module above the reactive gas showerhead module. The injection tubes of the reactive gas showerhead module pass through the cooling jacket disposed below the reactive gas showerhead module, and the injection tubes of the purge gas showerhead module pass through the reactive gas showerhead module disposed below the purge gas showerhead module, thereby enabling the purge gas to flow into a purge gas redistribution space defined above the cooling jacket.

Abstract translation: 提出了一种用于成膜真空设备的喷头，其具有缩短反应气体的注射管的长度的效果。 注射管从反应性气体喷头模块的底部延伸，并且两种不同种类的反应气体与反应性喷头模块内的注射支撑气体混合，以便注入混合气体。 用于成膜真空设备的喷头包括在冷却套上方的反应性气体喷头模块和在反应性气体喷头模块上方的吹扫气喷头模块。 反应性气体喷头模块的注射管通过设置在反应性气体喷头模块下方的冷却套管，并且吹扫气体喷头模块的注射管通过布置在吹扫气喷头模块下方的反应性气体喷头模块， 吹扫气体流入冷却套管上方定义的净化气体再分布空间。